发明授权
- 专利标题: Method for the determination of nitrogen concentration in compound semiconductor
- 专利标题(中): 化合物半导体氮浓度测定方法
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申请号: US614206申请日: 1996-03-12
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公开(公告)号: US5731209A公开(公告)日: 1998-03-24
- 发明人: Masato Yamada , Munehisa Yanagisawa , Susumu Higuchi
- 申请人: Masato Yamada , Munehisa Yanagisawa , Susumu Higuchi
- 申请人地址: JPX Tokyo
- 专利权人: Shin-Etsu Handotai Co., Ltd.
- 当前专利权人: Shin-Etsu Handotai Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX7-055509 19950315
- 主分类号: G01N21/31
- IPC分类号: G01N21/31 ; H01L21/66 ; H01L33/30 ; G01N21/59
摘要:
An efficient method is proposed for the determination of the concentration of nitrogen in an indirect-transition compound semiconductor such as gallium phosphide added as an isoelectronic trap. The method utilizes the fact that a good correlation of proportionality is held between the nitrogen concentration and the difference .DELTA..alpha.(=.alpha..sub.N -.alpha.) in the absorption coefficient of light of a wavelength identical with the wavelength .lambda..sub.N due to the excitons under constraint in the isoelectronic trap between the semiconductors with (.alpha..sub.N) and without (.alpha.) addition of nitrogen. A working curve is presented between the nitrogen concentration determined by the method of SIMS and the value of .DELTA..alpha..
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