发明授权
- 专利标题: Method and apparatus for removing trace quantities of impurities from liquified bulk gases
- 专利标题(中): 从液化散体气体中除去痕量杂质的方法和设备
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申请号: US786576申请日: 1997-01-21
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公开(公告)号: US5737941A公开(公告)日: 1998-04-14
- 发明人: Thomas Hsiao-Ling Hsiung , Jose Rui Souto Machado , Alexander Schwarz
- 申请人: Thomas Hsiao-Ling Hsiung , Jose Rui Souto Machado , Alexander Schwarz
- 申请人地址: PA Allentown
- 专利权人: Air Products and Chemicals, Inc.
- 当前专利权人: Air Products and Chemicals, Inc.
- 当前专利权人地址: PA Allentown
- 主分类号: B01D53/04
- IPC分类号: B01D53/04 ; F25J3/08 ; F25J1/00
摘要:
Method and apparatus for removing trace levels of impurities from gases stored cryogenically in a storage vessel in liquid form by passing a vaporized portion of liquified gas from the storage vessel through a bed of adsorbent while using the liquified gas to cool the adsorbent. Vaporized gas resulting from cooling of the adsorbent with the stored liquified gas can be combined with the vapor withdrawn from the storage vessel prior to being passed through the bed of adsorbent. Liquified gas can be withdrawn from the storage vessel, vaporized and the vaporized gas combined with the vaporized gas from the storage vessel prior to being passed through the bed of adsorbent.
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