发明授权
- 专利标题: Vacuum arc deposition apparatus
- 专利标题(中): 真空电弧沉积设备
-
申请号: US357752申请日: 1994-12-16
-
公开(公告)号: US5744017A公开(公告)日: 1998-04-28
- 发明人: Hiroshi Tamagaki , Hiroshi Kawaguchi , Hirofumi Fujii , Katsuhiko Shimojima , Takeshi Suzuki , Koji Hanaguri
- 申请人: Hiroshi Tamagaki , Hiroshi Kawaguchi , Hirofumi Fujii , Katsuhiko Shimojima , Takeshi Suzuki , Koji Hanaguri
- 申请人地址: JPX Kobe
- 专利权人: Kabushiki Kaisha Kobe Seiko Sho
- 当前专利权人: Kabushiki Kaisha Kobe Seiko Sho
- 当前专利权人地址: JPX Kobe
- 优先权: JPX5-318603 19931217; JPX5-320379 19931220; JPX5-322763 19931221
- 主分类号: C23C14/32
- IPC分类号: C23C14/32 ; H01J37/32 ; C23C14/22
摘要:
A vacuum arc deposition apparatus includes arc power sources having cathodes connected to both ends of an evaporation source; exciting coils disposed at positions axially outwardly far from both the ends of the evaporation source so as to be coaxial with the evaporation source; and coil power sources independently connected to the exciting coils. In this apparatus, each of the coil power sources is capable of controlling the exciting current in such a manner that the film thickness and the consumption of the evaporation source are suitably distributed. Moreover, an arc containment device of the vacuum arc deposition apparatus includes an arc containment body having a diameter substantially the same as that of a cylindrical evaporation source, which is disposed at one end portion of the evaporation source.
公开/授权文献
- US4915127A Compressed gas regulator with pressurized sealed bonnet 公开/授权日:1990-04-10
信息查询
IPC分类: