发明授权
- 专利标题： Process for producing a surface acoustic wave device
- 专利标题（中）： 制造表面声波装置的方法
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申请号： US676504申请日： 1996-07-08
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公开(公告)号： US5774962A公开(公告)日： 1998-07-07
- 发明人: Yoshio Satoh , Osamu Ikata , Hidema Uchishiba , Takashi Matsuda , Tokihiro Nishihara , Mitsuo Takanatsu , Hajime Taniguchi
- 申请人： Yoshio Satoh , Osamu Ikata , Hidema Uchishiba , Takashi Matsuda , Tokihiro Nishihara , Mitsuo Takanatsu , Hajime Taniguchi
- 申请人地址： JPX Kawasaki
- 专利权人： Fujitsu Limited
- 当前专利权人： Fujitsu Limited
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX5-268542 19931027
- 主分类号： H01L21/60
- IPC分类号： H01L21/60 ; H03H3/08 ; H03H9/145 ; H04R17/00
摘要：
This invention relates to a surface acoustic wave device and a production process thereof. An electrode is formed by alternately laminating a film of an aluminum alloy containing at least copper added thereto and a copper film on a piezoelectric substrate. While the particle size of the multi-layered electrode materials is kept small, the occurrence of voids in the film is prevented and life time of the surface acoustic wave device is elongated.
公开/授权文献
- US5123592A Pressure independent control for air distribution system 公开/授权日：1992-06-23
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