发明授权
- 专利标题: High-strength porous silicon nitride body and process for producing the same
- 专利标题(中): 高强度多孔氮化硅体及其制造方法
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申请号: US774612申请日: 1996-12-30
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公开(公告)号: US5780374A公开(公告)日: 1998-07-14
- 发明人: Chihiro Kawai , Takahiro Matsuura , Akira Yamakawa
- 申请人: Chihiro Kawai , Takahiro Matsuura , Akira Yamakawa
- 申请人地址: JPX
- 专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人地址: JPX
- 优先权: JPX8-001120 19960109; JPX8-001121 19960109; JPX8-322420 19961203
- 主分类号: C04B35/584
- IPC分类号: C04B35/584 ; C04B38/00 ; C04B38/06
摘要:
A high-porosity and high-strength porous silicon nitride body comprises columnar silicon nitride grains and an oxide bond phase containing 2 to 15 wt. %, in terms of oxide based on silicon nitride, of at least one rare earth element, and has an SiO.sub.2 /(SiO.sub.2 +rare earth element oxide) weight ratio of 0.012 to 0.65 and an average pore size of at most 3.5 .mu.m. The porous silicon nitride body is produced by compacting comprising a silicon nitride powder, 2 to 15 wt. %, in terms of oxide based on silicon nitride, of at least one rare earth element, and an organic binder while controlling the oxygen content and carbon content of said compact; and sintering said compact in an atmosphere comprising nitrogen at 1,650.degree. to 2,200.degree. C. to obtain a porous body having a three-dimensionally entangled structure made up of columnar silicon nitride grains and an oxide bond phase, and having an SiO.sub.2 /(SiO.sub.2 +rare earth element oxide) weight ratio of 0.012 to 0.65.
公开/授权文献
- US5257068A Clamshell-type electrophotographic duplex printer 公开/授权日:1993-10-26
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