发明授权
- 专利标题： Sputtering target for producing optical recording medium
- 专利标题（中）： 用于制造光记录介质的溅射靶
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申请号： US571087申请日： 1995-12-12
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公开(公告)号： US5785828A公开(公告)日： 1998-07-28
- 发明人: Katsuyuki Yamada , Hiroko Iwasaki , Yukio Ide , Makoto Harigaya , Yoshiyuki Kageyama , Hiroshi Deguchi , Masaetsu Takahashi , Yoshitaka Hayashi
- 申请人： Katsuyuki Yamada , Hiroko Iwasaki , Yukio Ide , Makoto Harigaya , Yoshiyuki Kageyama , Hiroshi Deguchi , Masaetsu Takahashi , Yoshitaka Hayashi
- 申请人地址： JPX Tokyo
- 专利权人： Ricoh Company, Ltd.
- 当前专利权人： Ricoh Company, Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX6-332532 19941213
- 主分类号： B22F1/00
- IPC分类号： B22F1/00 ; B22F3/10 ; B32B3/00 ; B32B3/02 ; C22C1/04 ; C23C14/06 ; C23C14/34 ; G11B7/243 ; G11B7/253 ; G11B7/2534 ; G11B7/254 ; G11B7/2542 ; G11B7/258 ; G11B7/2585 ; G11B7/259 ; G11B7/2595 ; G11B7/26
摘要：
A sputtering target for fabricating a recording layer of a phase-change type optical recording medium contains a compound or mixture including as constituent elements Ag, In, Te and Sb with the respective atomic percent (atom.%) of .alpha., .beta., .gamma.and .delta.thereof being in the relationship of 2.ltoreq..alpha..ltoreq.30, 3.ltoreq..beta..ltoreq.30, 10.ltoreq..gamma..ltoreq.50, 15.ltoreq..delta..ltoreq.83 and .alpha.+.beta.+.gamma.+.delta.=100, and a method of producing the above sputtering target is provided. A phase-change type optical recording medium includes a recording layer containing as constituent elements Ag, In, Te and Sb with the respective atomic percent of .alpha., .beta., .gamma.and .delta.thereof being in the relationship of 0
公开/授权文献
- US5085211A Plaster cast mold and liner 公开/授权日：1992-02-04
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