发明授权
- 专利标题： X-ray enhanced SEM critical dimension measurement
- 专利标题（中）： X射线增强SEM临界尺寸测量
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申请号： US670484申请日： 1996-06-26
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公开(公告)号： US5798525A公开(公告)日： 1998-08-25
- 发明人: Peter Benizri-Carl , Wolfgang Egert , Manfred Jung , Theodore Gerard van Kessel
- 申请人： Peter Benizri-Carl , Wolfgang Egert , Manfred Jung , Theodore Gerard van Kessel
- 申请人地址： NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： NY Armonk
- 主分类号： G01B15/00
- IPC分类号： G01B15/00 ; G01N23/225 ; H01J37/28 ; H01J37/252
摘要：
Structures having high height to width ratios may be measured using X-ray techniques, where the surrounding base and the structure are composed of different substances. The technique combines X-ray detection with scanning electron microscope (SEM) beam scanning. The X-ray emission is set to detect the presence of a specific substance which is either in the structure or surrounding the structure.
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