发明授权
US5801965A Method and system for manufacturing semiconductor devices, and method
and system for inspecting semiconductor devices
失效
用于制造半导体器件的方法和系统以及用于检查半导体器件的方法和系统
- 专利标题: Method and system for manufacturing semiconductor devices, and method and system for inspecting semiconductor devices
- 专利标题(中): 用于制造半导体器件的方法和系统以及用于检查半导体器件的方法和系统
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申请号: US362763申请日: 1994-12-22
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公开(公告)号: US5801965A公开(公告)日: 1998-09-01
- 发明人: Yuji Takagi , Hideaki Doi , Makoto Ono
- 申请人: Yuji Takagi , Hideaki Doi , Makoto Ono
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX5-334606 19931228
- 主分类号: G01B11/24
- IPC分类号: G01B11/24 ; G01N21/94 ; G01R31/26 ; H01L21/66 ; G06F19/00
摘要:
The present invention relates to a method and system of inspecting a product, including extracting defects from the product, classifying the defects on the basis of information about the extracted defects representing the analogy of the defects, extracting the feature data of the defects on the basis of the result of defect classification, and feeding back the feature data of the extracted defects for inspection. The method and system is characterized in that the extracted feature data of the defects is fed back for inspecting the product. The present invention also relates to a method of manufacturing a semiconductor electric or electronic device, including extracting defects from the semiconductor electric or electronic device, classifying the defects on the basis of information about the extracted defects representing the analogy of the defects, extracting the feature data of the defects on the basis of the result of defect classification, and feeding back the feature data of the extracted defects to an apparatus for manufacturing the semiconductor electric or electronic device.
公开/授权文献
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