发明授权
- 专利标题: X-ray lithography masking
- 专利标题(中): X射线光刻掩模
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申请号: US770678申请日: 1996-12-20
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公开(公告)号: US5809103A公开(公告)日: 1998-09-15
- 发明人: Henry I. Smith , Michael Lim , James Carter , Mark Schattenburg
- 申请人: Henry I. Smith , Michael Lim , James Carter , Mark Schattenburg
- 申请人地址: MA Cambridge
- 专利权人: Massachusetts Institute of Technology
- 当前专利权人: Massachusetts Institute of Technology
- 当前专利权人地址: MA Cambridge
- 主分类号: G03F1/22
- IPC分类号: G03F1/22 ; G03F1/62 ; G03F1/64 ; G21K1/10 ; G21K5/00
摘要:
X-ray masking apparatus includes a frame having a supporting rim surrounding an x-ray transparent region, a thin membrane of hard inorganic x-ray transparent material attached at its periphery to the supporting rim covering the x-ray transparent region and a layer of x-ray opaque material on the thin membrane inside the x-ray transparent region arranged in a pattern to selectively transmit x-ray energy entering the x-ray transparent region through the membrane to a predetermined image plane separated from the layer by the thin membrane. A method of making the masking apparatus includes depositing back and front layers of hard inorganic x-ray transparent material on front and back surfaces of a substrate, depositing back and front layers of reinforcing material on the back and front layers, respectively, of the hard inorganic x-ray transparent material, removing the material including at least a portion of the substrate and the back layers of an inside region adjacent to the front layer of hard inorganic x-ray transparent material, removing a portion of the front layer of reinforcing material opposite the inside region to expose the surface of the front layer of hard inorganic x-ray transparent material separated from the inside region by the latter front layer, and depositing a layer of x-ray opaque material on the surface of the latter front layer adjacent to the inside region.
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