发明授权
- 专利标题： Transmission mask for charged particle beam exposure apparatuses, and an exposure apparatus using such a transmission mask
- 专利标题（中）： 带电粒子束曝光装置的透射掩模和使用这种透射掩模的曝光装置
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申请号： US739962申请日： 1996-10-30
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公开(公告)号： US5814423A公开(公告)日： 1998-09-29
- 发明人: Shigeru Maruyama , Hiroshi Yasuda , Yoshihisa Ooaeh
- 申请人： Shigeru Maruyama , Hiroshi Yasuda , Yoshihisa Ooaeh
- 申请人地址： JPX Kawasaki
- 专利权人： Fujitsu Limited
- 当前专利权人： Fujitsu Limited
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX8-105137 19960425
- 主分类号： H01J37/305
- IPC分类号： H01J37/305 ; H01L21/027 ; G03F9/00
摘要：
A transmission mask for a charged particle beam exposure apparatus that includes a mask substrate having a plurality of apertures arrange in a matrix and a pair of deflection electrodes at each aperture on one surface of the mask substrate. A beam shield layer having a reflectivity to the charged particle beam greater than the mask substrate is positioned on the other surface of the mask substrate. The transmission mask is installed in the apparatus so that the beam shield layer is oriented towards the charged particle beam to prevent an increase in temperature due to irradiation of the charged particle beam.
公开/授权文献
- US4959312A Full spectrum mutagenesis 公开/授权日：1990-09-25
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