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    Transmission mask for charged particle beam exposure apparatuses, and an exposure apparatus using such a transmission mask
    1.
    发明授权
    Transmission mask for charged particle beam exposure apparatuses, and an exposure apparatus using such a transmission mask 失效
    带电粒子束曝光装置的透射掩模和使用这种透射掩模的曝光装置

    公开(公告)号：US5814423A

    公开(公告)日：1998-09-29

    申请号：US739962

    申请日：1996-10-30

    申请人： Shigeru Maruyama ,  Hiroshi Yasuda ,  Yoshihisa Ooaeh

    发明人： Shigeru Maruyama ,  Hiroshi Yasuda ,  Yoshihisa Ooaeh

    IPC分类号： H01J37/305 ,  H01L21/027 ,  G03F9/00

    CPC分类号： G03F1/20

    摘要： A transmission mask for a charged particle beam exposure apparatus that includes a mask substrate having a plurality of apertures arrange in a matrix and a pair of deflection electrodes at each aperture on one surface of the mask substrate. A beam shield layer having a reflectivity to the charged particle beam greater than the mask substrate is positioned on the other surface of the mask substrate. The transmission mask is installed in the apparatus so that the beam shield layer is oriented towards the charged particle beam to prevent an increase in temperature due to irradiation of the charged particle beam.

    摘要翻译： 一种带电粒子束曝光装置的透射掩模，其包括具有排列成矩阵的多个孔的掩模基板和在掩模基板的一个表面上的每个孔处的一对偏转电极。 对掩模基板的带电粒子束具有反射率的光束屏蔽层位于掩模基板的另一个表面上。 透射掩模安装在设备中，使得屏蔽层朝向带电粒子束取向，以防止由于带电粒子束的照射引起的温度升高。

    Method and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elements
    4.
    发明授权
    Method and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elements 有权
    用于通过成形为多个光束元件的带电粒子束曝光物体上的曝光图案的方法和系统

    公开(公告)号：US6118129A

    公开(公告)日：2000-09-12

    申请号：US283974

    申请日：1999-04-01

    申请人： Yoshihisa Oae ,  Tomohiko Abe ,  Soichiro Arai ,  Shigeru Maruyama ,  Hiroshi Yasuda ,  Kenichi Miyazawa ,  Junichi Kai ,  Takamasa Satoh ,  Keiichi Betsui ,  Hideki Nasuno

    发明人： Yoshihisa Oae ,  Tomohiko Abe ,  Soichiro Arai ,  Shigeru Maruyama ,  Hiroshi Yasuda ,  Kenichi Miyazawa ,  Junichi Kai ,  Takamasa Satoh ,  Keiichi Betsui ,  Hideki Nasuno

    IPC分类号： H01J37/147 ,  H01J37/30 ,  H01J37/302 ,  H01J37/304 ,  H01J37/317

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3023 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/30416 ,  H01J2237/31762 ,  H01L2223/54466

    摘要： A method for exposing an exposure pattern on an object by a charged particle beam, including the steps of: shaping a charged particle beam into a plurality of charged particle beam elements in response to first bitmap data indicative of an exposure pattern, such that the plurality of charged particle beam elements are selectively turned off in response to the first bitmap data; focusing the charged particle beam elements upon a surface of an object; and scanning the surface of the object by the charged particle beam elements; the step of shaping including the steps of: expanding pattern data of said exposure pattern into second bitmap data having a resolution of n times (n.gtoreq.2) as large as, and m times (m.gtoreq.1) as large as, a corresponding resolution of the first bitmap data, respectively in X- and Y-directions; dividing the second bitmap data into cells each having a size of 2n bits in the X-direction and 2m bits in said Y-direction; and creating the first bitmap data from the second bitmap data by selecting four data bits from each of the cells, such that a selection of the data bits is made in each of the cells with a regularity in the X- and Y-directions and such that the number of rows in the X-direction and the number of columns in the Y-direction are both equal to 3 or more.

    摘要翻译： 一种用于通过带电粒子束曝光在物体上的曝光图案的方法，包括以下步骤：响应于指示曝光图案的第一位图数据，将带电粒子束成形为多个带电粒子束元件，使得多个 响应于第一位图数据选择性地关闭带电粒子束元件; 将带电粒子束元件聚焦在物体的表面上; 并通过带电粒子束元件扫描物体的表面; 整形步骤包括以下步骤：将所述曝光图案的图案数据扩展为分辨率为n倍（n> / = 2）分辨率的第二位图数据，并且m倍（m> / = 1） ，分别在X和Y方向上分别对应的第一位图数据的分辨率; 将第二位图数据分割成在X方向上具有2n位大小和在所述Y方向上具有2m位的单元， 以及通过从每个单元中选择四个数据位来从第二位图数据创建第一位图数据，使得在每个单元格中以X方向和Y方向上的规则性进行数据位的选择， X方向上的行数和Y方向上的列数都等于3或更大。

    Default device of actuator for variable lift valve operating mechanism
    10.
    发明申请
    Default device of actuator for variable lift valve operating mechanism 失效
    可变提升阀操作机构的执行器默认装置

    公开(公告)号：US20070199530A1

    公开(公告)日：2007-08-30

    申请号：US11701551

    申请日：2007-02-02

    申请人： Michihisa Tsutsumi ,  Shigeru Maruyama

    发明人： Michihisa Tsutsumi ,  Shigeru Maruyama

    IPC分类号： F01L1/34

    CPC分类号： F01L13/0063 ,  F01L13/0021 ,  F01L2105/00

    摘要： In a default device of an actuator for a variable lift valve operating mechanism, in the event of failure of the actuator, a pressed portion of a lever pivotably supported on a support shaft is urged by a resilient force of a coil spring, an arm is pressed by a cam portion of the lever to rotate a control shaft in one direction to prevent valve lift from being a predetermined value or lower. The support shaft that pivotably supports the lever of a default mechanism is placed in a position offset from a rotation axis of the control shaft. Thus, as compared with the case where the support shaft is placed coaxially with the control shaft, a large urging force is input from the lever to the control shaft to reliably prevent the valve lift from being the predetermined value or lower.

    摘要翻译： 在用于可变提升阀操作机构的致动器的默认装置中，在致动器发生故障的情况下，可枢转地支撑在支撑轴上的杠杆的按压部分被螺旋弹簧的弹力推动，臂是 由杠杆的凸轮部分按压以使控制轴沿一个方向旋转，以防止气门升程达到预定值或更低。 可枢转地支撑默认机构的杠杆的支撑轴被放置在偏离控制轴的旋转轴线的位置。 因此，与支撑轴与控制轴同轴配置的情况相比，从杠杆向控制轴输入大的作动力，可靠地将气门升程降低到规定值以下。