发明授权
US5814895A Static random access memory having transistor elements formed on side
walls of a trench in a semiconductor substrate
失效
具有形成在半导体衬底中的沟槽的侧壁上的晶体管元件的静态随机存取存储器
- 专利标题: Static random access memory having transistor elements formed on side walls of a trench in a semiconductor substrate
- 专利标题(中): 具有形成在半导体衬底中的沟槽的侧壁上的晶体管元件的静态随机存取存储器
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申请号: US769121申请日: 1996-12-19
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公开(公告)号: US5814895A公开(公告)日: 1998-09-29
- 发明人: Teruo Hirayama
- 申请人: Teruo Hirayama
- 申请人地址: JPX Tokyo
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX7-349532 19951222; JPX7-351052 19951225
- 主分类号: H01L21/8244
- IPC分类号: H01L21/8244 ; H01L27/11 ; H01L29/94
摘要:
In a static random access memory (SRAM), a memory cell ratio is increased without deteriorating an integration degree of this SRAM. The static random access memory is arranged by: trenches formed in a semiconductor substrate and an insulating layer for isolating elements within a memory cell forming region; one pair of word transistors; one pair of driver transistors for constituting a flip-flop by forming channel regions of the driver transistors in side surfaces of the trenches and by cross-connecting gate electrodes thereof and drain electrodes thereof at one pair of input/output terminals of the flip-flop; and one pair of word transistors connected between the one pair of input/output terminals of the flip-flop and a bit line.
公开/授权文献
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