- 专利标题: Photoelectric conversion device
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申请号: US554241申请日: 1995-11-08
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公开(公告)号: US5821597A公开(公告)日: 1998-10-13
- 发明人: Setsuo Nakajima , Yasuyuki Arai , Hisato Shinohara , Masayoshi Abe
- 申请人: Setsuo Nakajima , Yasuyuki Arai , Hisato Shinohara , Masayoshi Abe
- 申请人地址: JPX Kanagawa-ken JPX Chou-ku
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.,TDK Corporation
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.,TDK Corporation
- 当前专利权人地址: JPX Kanagawa-ken JPX Chou-ku
- 优先权: JPX4-269696 19920911; JPX4-269697 19920911
- 主分类号: H01L27/142
- IPC分类号: H01L27/142 ; H01L31/0392 ; H01L31/20 ; H01L31/075 ; H01L23/04 ; H01L31/105 ; H01L31/117
摘要:
A photoelectric conversion device taking the form of a thin film and having a substrate exhibiting poor thermal resistance. The device prevents thermal deformation which would normally be caused by local application of excessive heat to the substrate. The device has output terminals permitting the output from the device to be taken out. The output terminals are formed on the surface of the substrate opposite to the photoelectric conversion device. The device further includes electrical connector portions for electrically connecting the electrodes of the device with the output terminals. The present invention also provides a method of treating a substrate having poor thermal resistance with a plasma with a high throughput. The substrate is continuously supplied into a reaction chamber and treated with a plasma. This supply operation is carried out in such a way that the total length of the substrate existing in a plasma processing region formed by electrodes is longer than the length of the electrodes.
公开/授权文献
- US5076300A Dental floss 公开/授权日:1991-12-31