发明授权
- 专利标题: Thin-film transistor and method for fabricating same and liquid crystal display device
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申请号: US749675申请日: 1996-11-15
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公开(公告)号: US5846855A公开(公告)日: 1998-12-08
- 发明人: Makoto Igarashi , Takuya Watanabe
- 申请人: Makoto Igarashi , Takuya Watanabe
- 申请人地址: JPX Kawasaki
- 专利权人: Fujitsu Limited
- 当前专利权人: Fujitsu Limited
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX8-123382 19960517
- 主分类号: G02F1/136
- IPC分类号: G02F1/136 ; G02F1/1368 ; H01L21/336 ; H01L29/417 ; H01L29/45 ; H01L29/786 ; H01L21/00
摘要:
A thin-film transistor including a gate electrode provided on a substrate, a gate insulation film provided on the gate electrode, an operative semiconductor film provided on the gate insulation film, and a channel protection film provided on the operative semiconductor film. Semiconductor contact portions are disposed so that they are covered by the channel protection film on either side of the operative semiconductor film. A source electrode and a drain electrode are connected to the semiconductor contact portions on either side of the channel protection film. The thin-film transistor can minimize the stray capacitance due to the overlapping of the source and drain electrodes with the gate electrode and is excellent in the contact characteristic. Also, a method for fabricating a thin-film transistor is disclosed.
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