发明授权
- 专利标题： Method of and apparatus for cleaning workpiece
- 专利标题（中）： 清洁工件的方法和设备
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申请号： US716889申请日： 1996-09-20
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公开(公告)号： US5860181A公开(公告)日： 1999-01-19
- 发明人: Toshiro Maekawa , Satomi Hamada , Koji Ono , Atsushi Shigeta , Masako Kodera
- 申请人： Toshiro Maekawa , Satomi Hamada , Koji Ono , Atsushi Shigeta , Masako Kodera
- 申请人地址： JPX Tokyo JPX Kanagawa-ken
- 专利权人： Ebara Corporation,Kabushiki Kaisha Toshiba
- 当前专利权人： Ebara Corporation,Kabushiki Kaisha Toshiba
- 当前专利权人地址： JPX Tokyo JPX Kanagawa-ken
- 优先权： JPX7-266395 19950920
- 主分类号： B08B1/00
- IPC分类号： B08B1/00 ; B08B1/04 ; B24B53/007 ; H01L21/00 ; H01L21/304 ; H01L21/687 ; A46B13/02 ; A47L25/00
摘要：
A method of and an apparatus for cleaning workpiece is suitable for cleaning a substrate such as a semiconductor substrate, a glass substrate, or a liquid crystal panel to a high level of cleanliness. The method of cleaning a workpiece comprises the steps of holding a workpiece, scrubbing the workpiece with a cleaning member, and rubbing the cleaning member against a member having a rough surface to carry out a self-cleaning of the cleaning member. The cleaning member which is contaminated by having scrubbed the workpiece is rubbed against the rough surface, and the rough surface scrapes the contaminant off the cleaning member. Therefore, the contaminant can effectively be removed from the cleaning member, and hence the cleaning member has a high self-cleaning effect.
公开/授权文献
- USD290695S Video cassette recorder 公开/授权日：1987-07-07
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