Invention Grant
- Patent Title: Method for forming an indium antimonide layer
- Patent Title (中): 锑化铟层的形成方法
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Application No.: US918871Application Date: 1997-08-26
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Publication No.: US5861069APublication Date: 1999-01-19
- Inventor: Seung-Ho Lee
- Applicant: Seung-Ho Lee
- Applicant Address: KRX Seoul
- Assignee: SKM Limited
- Current Assignee: SKM Limited
- Current Assignee Address: KRX Seoul
- Priority: KRX199637490 19960831; KRX199717027 19970502; KRX199717028 19970502
- Main IPC: C23C14/06
- IPC: C23C14/06 ; C23C14/16 ; C23C14/58 ; C23C28/02 ; H01L43/06 ; H01L21/24
Abstract:
A method forms an indium antimonide layer by a sequential evaporation for use as a magnetic sensing material having high electron mobility. The method includes the steps of: (a) preparing a substrate; (b) pre-heating the substrate (c) depositing an antimony layer on top of the substrate; (d) forming an indium layer on top of the antimony layer to thereby obtain a sequentially deposited layer, wherein the sequentially deposited layer includes the antimony and the indium layers; (e) providing a protection layer on top of the sequentially deposited layer; and (f) heat treating the sequentially deposited layer to force inter-diffusion of antimony and indium, thereby producing the indium antimonide layer.
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