发明授权
- 专利标题: Wafer with elevated contact structures
- 专利标题(中): 具有高架接触结构的晶圆
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申请号: US518740申请日: 1995-08-24
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公开(公告)号: US5874782A公开(公告)日: 1999-02-23
- 发明人: Anthony Michael Palagonia
- 申请人: Anthony Michael Palagonia
- 申请人地址: NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: NY Armonk
- 主分类号: H01L21/56
- IPC分类号: H01L21/56 ; H01L23/485 ; H01L23/48 ; H01L23/52 ; H01L29/00 ; H01L29/40
摘要:
Disclosed is a semiconductor wafer, and the method of making the same, the wafer being formed to have a multiplicity of raised contact pads on its surface. The contact pads are formed with conductors which are disposed on the surface of the wafer and which are coupled to internal circuitry embedded in the wafer through vias in the wafer's surface. The contact pads are in a raised elevational relationship relative to the surface conductors. After the wafer is fully processed, by dicing individual integrated circuit chips out of the wafer, each chip can then be mounted on a higher level of assembly, such as a printed circuit board. The raised contact pads originally formed on the wafer, and therefore formed on each individual chip, provide the contact points by which the chip can be bonded with matingly arranged contact pads on the higher level of assembly.
公开/授权文献
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