Testing integrated circuit chips
    1.
    发明授权
    Testing integrated circuit chips 失效
    测试集成电路芯片

    公开(公告)号:US6037786A

    公开(公告)日:2000-03-14

    申请号:US767999

    申请日:1996-12-13

    摘要: An interposer for making a penetrating temporary contact between the contact pads of a chip having bumped or unbumped I/O pads and a test board for the purpose of testing the chip is disclosed. The interposer comprises a silicon substrate having sharp penetrating structures integrally formed at a predetermined depth in the silicon substrate along crystallographic planes. The resultant apparatus has a matching lateral thermal expansion to the chip being tested and provides uniform contact to all chip I/O pads.

    摘要翻译: 公开了一种用于在具有凸起或未凸起的I / O焊盘的芯片的接触焊盘之间进行穿透性临时接触的插入件和用于测试芯片的测试板。 插入器包括具有沿着晶面平行于硅衬底中的预定深度一体形成的尖锐穿透结构的硅衬底。 所得到的装置具有与所测试的芯片的匹配横向热膨胀,并提供与所有芯片I / O焊盘的均匀接触。

    Method for forming an interposer for making temporary contact with pads of a semiconductor chip
    2.
    发明授权
    Method for forming an interposer for making temporary contact with pads of a semiconductor chip 失效
    用于形成用于与半导体芯片的焊盘暂时接触的插入件的方法

    公开(公告)号:US06188231B1

    公开(公告)日:2001-02-13

    申请号:US09453130

    申请日:1999-12-02

    IPC分类号: G01R3102

    摘要: An interposer for making a penetrating temporary contact between the contact pads of a chip having bumped or unbumped I/O pads and a test board for the purpose of testing said chip is disclosed. The interposer comprises a silicon substrate having sharp penetrating structures integrally formed at a predetermined depth in the silicon substrate along crystallographic planes. The resultant apparatus has a matching lateral thermal expansion to the chip being tested and provides uniform contact to all chip I/O pads.

    摘要翻译: 公开了一种用于在具有凸起或未凸起的I / O焊盘的芯片的接触焊盘之间进行穿透性临时接触的插入件和用于测试所述芯片的测试板。 插入器包括具有沿着晶面平行于硅衬底中的预定深度一体形成的尖锐穿透结构的硅衬底。 所得到的装置具有与所测试的芯片的匹配横向热膨胀,并提供与所有芯片I / O焊盘的均匀接触。

    Wafer with elevated contact structures
    6.
    发明授权
    Wafer with elevated contact structures 失效
    具有高架接触结构的晶圆

    公开(公告)号:US5874782A

    公开(公告)日:1999-02-23

    申请号:US518740

    申请日:1995-08-24

    摘要: Disclosed is a semiconductor wafer, and the method of making the same, the wafer being formed to have a multiplicity of raised contact pads on its surface. The contact pads are formed with conductors which are disposed on the surface of the wafer and which are coupled to internal circuitry embedded in the wafer through vias in the wafer's surface. The contact pads are in a raised elevational relationship relative to the surface conductors. After the wafer is fully processed, by dicing individual integrated circuit chips out of the wafer, each chip can then be mounted on a higher level of assembly, such as a printed circuit board. The raised contact pads originally formed on the wafer, and therefore formed on each individual chip, provide the contact points by which the chip can be bonded with matingly arranged contact pads on the higher level of assembly.

    摘要翻译: 公开了一种半导体晶片及其制造方法,晶片形成为在其表面上具有多个凸起的接触焊盘。 接触焊盘由导体组成,它们设置在晶片的表面上,并通过晶片表面中的通孔与嵌入晶片的内部电路相连。 接触垫相对于表面导体处于升高的高度关系。 在晶片完全处理之后,通过将单个集成电路芯片切割出晶片,每个芯片然后可以安装在诸如印刷电路板的更高级别的组件上。 原来形成在晶片上并因此形成在每个单独芯片上的凸起接触垫提供接触点,通过该接触点,芯片可以在更高级别的组件上配合布置的接触焊盘接合。

    Method for fabrication of silicon on insulator substrates
    8.
    发明授权
    Method for fabrication of silicon on insulator substrates 失效
    硅绝缘体基板制造方法

    公开(公告)号:US06239469B1

    公开(公告)日:2001-05-29

    申请号:US09677059

    申请日:2000-09-29

    IPC分类号: H01L2701

    摘要: A method for forming a silicon on insulator region on a single crystal silicon substrate, comprising the steps of: forming a first dielectric region in a silicon substrate by etching, deposition, and chemical-mechanical polishing; forming a single crystal layer on the substrate by polysilicon deposition and re-growth or epitaxial growth; removing portions of the single crystal layer to produce silicon islands that are fully on the first dielectric region; and filling in the spaces between the silicon islands with a second dielectric, by deposition and chemical-mechanical-polish, that overlaps peripheral portions of the first dielectric. Additional steps subdivide the fully isolated silicon on insulator regions by etching trenches in the islands and backfilling with a third dielectric, by deposition and chemical-mechanical-polish.

    摘要翻译: 一种在单晶硅衬底上形成绝缘体上硅区域的方法,包括以下步骤:通过蚀刻,沉积和化学机械抛光在硅衬底中形成第一电介质区域; 通过多晶硅沉积和再生长或外延生长在衬底上形成单晶层; 去除单晶层的部分以产生完全在第一介电区域上的硅岛; 以及通过与第一电介质的外围部分重叠的沉积和化学机械抛光来填充硅岛之间的空间与第二电介质。 附加步骤通过蚀刻岛中的沟槽并通过沉积和化学机械抛光来用第三电介质回填来细分绝缘体上的完全隔离的区域。

    Micro probe ring assembly and method of fabrication
    9.
    发明授权
    Micro probe ring assembly and method of fabrication 失效
    微型探针环组件及其制造方法

    公开(公告)号:US06232143B1

    公开(公告)日:2001-05-15

    申请号:US09448110

    申请日:1999-11-23

    IPC分类号: H01L2144

    CPC分类号: G01R1/06711 G01R1/07342

    摘要: A multi-probe ring assembly including integral fine probe tips, conductive lines with terminal connection for testing semiconductor devices and a method of construction of the multi-probe ring assembly is described. The method of construction described utilizes the step of etching pits into silicon wafers to produce molds for forming the probe points. Semiconductor machining processes are used to complete the probe ring assembly.

    摘要翻译: 描述了包括整体精细探针尖端,具有用于测试半导体器件的端子连接的导线以及多探针环组件的构造方法的多探针环组件。 所描述的结构的方法利用将凹坑蚀刻到硅晶片中以形成用于形成探针点的模具的步骤。 半导体加工工艺用于完成探头环组件。

    Wafer with elevated contact substructures
    10.
    发明授权
    Wafer with elevated contact substructures 失效
    具有高架接触子结构的晶圆

    公开(公告)号:US5907785A

    公开(公告)日:1999-05-25

    申请号:US826362

    申请日:1997-03-26

    摘要: Disclosed is a semiconductor wafer, and the method of making the same, the wafer being formed to have a multiplicity of raised contact pads on its surface. The contact pads are formed with conductors which are disposed on the surface of the wafer and which are coupled to internal circuitry embedded in the wafer rough vias in the wafers surface. The contact pads are in a raised elevational relationship relative to the surface conductors. After the wafer is fully processed, by dicing individual integrated circuit chips out of the wafer, each chip can then be mounted on a higher level of assembly, such as a printed circuit board. The raised contact pads originally formed on the wafer, and therefore formed on each individual chip, provide the contact points by which the chip can be bonded with matingly arranged contact pads on the higher level of assembly.

    摘要翻译: 公开了一种半导体晶片及其制造方法,晶片形成为在其表面上具有多个凸起的接触焊盘。 接触焊盘由设置在晶片的表面上的导体形成,并且被连接到嵌入在晶片表面中的晶片粗糙过孔中的内部电路。 接触垫相对于表面导体处于升高的高度关系。 在晶片完全处理之后,通过将单个集成电路芯片切割出晶片,每个芯片然后可以安装在诸如印刷电路板的更高级别的组件上。 原来形成在晶片上并因此形成在每个单独芯片上的凸起接触垫提供接触点,通过该接触点,芯片可以在更高级别的组件上配合布置的接触焊盘接合。