发明授权
- 专利标题: Wafer cleaning apparatus
- 专利标题(中): 晶圆清洗设备
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申请号: US683654申请日: 1996-07-15
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公开(公告)号: US5875507A公开(公告)日: 1999-03-02
- 发明人: Donald Edgar Stephens , Oliver David Jones , Hugo John Miller, III
- 申请人: Donald Edgar Stephens , Oliver David Jones , Hugo John Miller, III
- 申请人地址: CA Scotts Valley
- 专利权人: Oliver Design, Inc.
- 当前专利权人: Oliver Design, Inc.
- 当前专利权人地址: CA Scotts Valley
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; A47L25/00
摘要:
An apparatus for cleaning a wafer oriented vertically is provided. The apparatus includes a first brush and a second brush located horizontally from the first brush. During use, a wafer is orientated vertically between the first and second brushes. The brushes are brought into contact with the wafer and rotated thereby engaging the wafer with rollers. By rotating the rollers, the wafer is also rotated. Liquid is sprayed towards the brushes and wafer. By orienting the wafer vertically, liquid and particulates contained therein readily fall from the wafer due to gravity. This is particularly advantageous when cleaning larger diameter wafers in which particulates must be removed from a larger wafer surface area.
公开/授权文献
- USD344320S Insect swatter 公开/授权日:1994-02-15