公开(公告)号：US5490809A

公开(公告)日：1996-02-13

申请号：US234778

申请日：1994-04-28

申请人： Oliver D. Jones ,  Donald E. Stephens

发明人： Oliver D. Jones ,  Donald E. Stephens

IPC分类号： B24B7/17 ,  B24B37/08 ,  G11B5/82 ,  B24B57/02

CPC分类号： G11B5/82 ,  B24B37/08 ,  B24B7/17 ,  B82Y10/00 ,  G11B5/743

摘要： In the texturing unit of this invention a data storage disk is gripped between a pair of opposed, counter-rotating cylindrical abrasive mandrels, which are covered with soft, porous pads. The frictional force between the disk and the pads raises the edge of the disk against a pair of driven rollers which impart a rotational motion to the disk. A texture pattern of uniform grooves, having controlled peak heights and valley depths, is formed simultaneously on both sides of the disk. A system for delivering an abrasive slurry to the pads includes a closed loop in which the slurry is recirculated and a dispense section of that loop, from which a blast of pressurized air periodically expels the slurry through applicators and onto the pads. The continuous recirculation of the slurry prevents settling.A unique feature is that the groove length may be controlled by adjusting the ratio between the rotational speeds of the disk and mandrels. The groove pattern is primarily circular but a radial component may be added by varying the position at which the pads contact the surfaces of the disk.

公开(公告)号：US5778554A

公开(公告)日：1998-07-14

申请号：US680739

申请日：1996-07-15

申请人： Oliver David Jones

发明人： Oliver David Jones

IPC分类号： H01L21/00 ,  F26B17/24

CPC分类号： H01L21/67034 ,  Y10S134/902

摘要： In a spin dryer for semiconductor wafers, the wafer is held beneath a platen with its active side (i.e., the side containing the components or circuitry) facing upward. One or more nozzles spray rinse water on the top surface of the wafer and the wafer is rotated to remove the excess rinse water, thereby drying the wafer. A splash guard adjacent the edge of the wafer insures that the excess rinse water thrown off by the spinning wafer is deflected downward where it cannot again come into contact with the active side of the wafer. The platen is rotated dry at the same time, with no rinse water being splashed back onto the active side of the wafer. The spin dryer also includes a separate section which cleans and dries the end-effector of the robot which inserts the wafer into the spin dryer while the wafer is being dried.

摘要翻译： 在用于半导体晶片的旋转干燥器中，晶片被保持在压板下方，其活动侧（即，包含部件或电路的一侧）面向上。 一个或多个喷嘴在晶片的顶表面上喷洒漂洗水，并旋转晶片以除去多余的冲洗水，从而干燥晶片。 与晶片边缘相邻的防溅罩确保了旋转晶片抛出的多余的冲洗水向下偏转，在那里不能再与晶片的活动侧接触。 压板同时旋转干燥，没有冲洗水溅回到晶片的活动侧。 旋转干燥机还包括一个单独的部分，其清洁并干燥机器人的末端执行器，其将晶片插入旋转干燥器中，同时晶片被干燥。

公开(公告)号：US5875507A

公开(公告)日：1999-03-02

申请号：US683654

申请日：1996-07-15

申请人： Donald Edgar Stephens ,  Oliver David Jones ,  Hugo John Miller, III

发明人： Donald Edgar Stephens ,  Oliver David Jones ,  Hugo John Miller, III

IPC分类号： H01L21/00 ,  A47L25/00

CPC分类号： H01L21/67051 ,  H01L21/67046 ,  Y10S134/902

摘要： An apparatus for cleaning a wafer oriented vertically is provided. The apparatus includes a first brush and a second brush located horizontally from the first brush. During use, a wafer is orientated vertically between the first and second brushes. The brushes are brought into contact with the wafer and rotated thereby engaging the wafer with rollers. By rotating the rollers, the wafer is also rotated. Liquid is sprayed towards the brushes and wafer. By orienting the wafer vertically, liquid and particulates contained therein readily fall from the wafer due to gravity. This is particularly advantageous when cleaning larger diameter wafers in which particulates must be removed from a larger wafer surface area.

摘要翻译： 提供一种用于清洗垂直取向晶片的设备。 该装置包括从第一刷子水平定位的第一刷和第二刷。 在使用期间，晶片在第一和第二刷之间垂直取向。 刷子与晶片接触并旋转，从而使晶片与辊接合。 通过旋转辊，晶片也旋转。 液体向电刷和晶片喷射。 通过垂直定向晶片，容纳在其中的液体和微粒由于重力而容易从晶片上落下。 当清洁其中微粒必须从更大的晶片表面区域去除的较大直径的晶片时，这是特别有利的。

公开(公告)号：US5486134A

公开(公告)日：1996-01-23

申请号：US842695

申请日：1992-02-27

申请人： Oliver D. Jones ,  Donald E. Stephens

发明人： Oliver D. Jones ,  Donald E. Stephens

IPC分类号： B24B7/17 ,  B24B37/08 ,  G11B5/82 ,  B24B29/02

CPC分类号： G11B5/82 ,  B24B37/08 ,  B24B7/17 ,  B82Y10/00 ,  G11B5/743

摘要： In the texturing unit of this invention a data storage disk is gripped between a pair of opposed, counter-rotating cylindrical abrasive mandrels, which are covered with soft, porous pads. The frictional force between the disk and the pads raises the edge of the disk against a pair of driven rollers which impart a rotational motion to the disk. A texture pattern of uniform grooves, having controlled peak heights and valley depths, is formed simultaneously on both sides of the disk. A system for delivering an abrasive slurry to the pads includes a closed loop in which the slurry is recirculated and a dispense section of that loop, from which a blast of pressurized air periodically expels the slurry through applicators and onto the pads. The continuous recirculation of the slurry prevents settling.A unique feature is that the groove length may be controlled by adjusting the ratio between the rotational speeds of the disk and mandrels. The groove pattern is primarily circular but a radial component may be added by varying the position at which the pads contact the surfaces of the disk.

摘要翻译： 在本发明的纹理单元中，数据存储盘被夹在一对相对的反向旋转的圆柱形磨料心轴之间，其被柔软的多孔垫覆盖。 盘和垫之间的摩擦力使盘的边缘抵靠一对驱动辊，这些从动辊向盘提供旋转运动。 在盘的两侧同时形成具有受控峰高和谷深度的均匀凹槽的纹理图案。 用于将磨料浆料输送到衬垫的系统包括闭合回路，其中浆料被再循环，并且该循环的分配部分，加压空气鼓风从该循环周期性地排出浆料通过施加器并且到达衬垫。 浆料的连续再循环防止沉降。 一个独特的特征是可以通过调节盘和心轴的转速之间的比例来控制槽长度。 凹槽图案主要是圆形的，但是可以通过改变垫接触盘表面的位置来添加径向分量。