Invention Grant
US5879843A Method of reducing registration error in exposure step of semiconductor
device
失效
降低半导体器件曝光步骤中的配准误差的方法
- Patent Title: Method of reducing registration error in exposure step of semiconductor device
- Patent Title (中): 降低半导体器件曝光步骤中的配准误差的方法
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Application No.: US7362Application Date: 1998-01-15
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Publication No.: US5879843APublication Date: 1999-03-09
- Inventor: Atsushi Ueno
- Applicant: Atsushi Ueno
- Applicant Address: JPX Tokyo
- Assignee: Mitsubishi Denki Kabushiki Kaisha
- Current Assignee: Mitsubishi Denki Kabushiki Kaisha
- Current Assignee Address: JPX Tokyo
- Priority: JPX7-334794 19951222
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00 ; H01L21/027
Abstract:
A method of reducing a registration error is provided in which the registration error can be uniformly distributed even if an amount of displacement is larger than others at only one of a plurality of measuring points. According to the method, amounts of displacement are measured first at a plurality of measuring points, then one half the sum of the maximum value and the minimum value of the measured amounts of displacement is calculated to obtain a correction value. The correction value is fed back to an exposure apparatus as a correction value for an exposure condition setting file within the exposure apparatus used in an exposure step. The registration error can be distributed uniformly even if amounts of displacement at a plurality of measuring points are considerably different from each other.
Public/Granted literature
- USD355010S Golf club head Public/Granted day:1995-01-31
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