发明授权
US5879843A Method of reducing registration error in exposure step of semiconductor
device
失效
降低半导体器件曝光步骤中的配准误差的方法
- 专利标题: Method of reducing registration error in exposure step of semiconductor device
- 专利标题(中): 降低半导体器件曝光步骤中的配准误差的方法
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申请号: US7362申请日: 1998-01-15
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公开(公告)号: US5879843A公开(公告)日: 1999-03-09
- 发明人: Atsushi Ueno
- 申请人: Atsushi Ueno
- 申请人地址: JPX Tokyo
- 专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人: Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX7-334794 19951222
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G03F9/00 ; H01L21/027
摘要:
A method of reducing a registration error is provided in which the registration error can be uniformly distributed even if an amount of displacement is larger than others at only one of a plurality of measuring points. According to the method, amounts of displacement are measured first at a plurality of measuring points, then one half the sum of the maximum value and the minimum value of the measured amounts of displacement is calculated to obtain a correction value. The correction value is fed back to an exposure apparatus as a correction value for an exposure condition setting file within the exposure apparatus used in an exposure step. The registration error can be distributed uniformly even if amounts of displacement at a plurality of measuring points are considerably different from each other.
公开/授权文献
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