公开(公告)号：US07357578B2

公开(公告)日：2008-04-15

申请号：US11652620

申请日：2007-01-12

Applicant: Tadashi Watai ,  Kazuyuki Miyata ,  Atsushi Ueno ,  Ryohei Kaneko

Inventor： Tadashi Watai ,  Kazuyuki Miyata ,  Atsushi Ueno ,  Ryohei Kaneko

IPC: F16C17/04

CPC classification number: F16C33/1075 ,  B60G11/16 ,  B60G15/063 ,  B60G15/068 ,  B60G2202/312 ,  B60G2204/124 ,  B60G2204/128 ,  B60G2204/418 ,  B60G2204/4502 ,  F16C17/04 ,  F16C33/102 ,  F16C33/201 ,  F16C2326/05

Abstract: A thrust sliding bearing includes an upper casing having a polyacetal resin-made flat annular surface and a lower casing superposed on the upper casing so as to be rotatable about an axis of the upper casing and having a polyacetal resin-made annular surface opposing the annular surface of the upper casing.

Abstract translation: 推力滑动轴承包括具有聚缩醛树脂制平面环形表面的上壳体和叠置在上壳体上的下壳体，以便能够围绕上壳体的轴线旋转，并且具有与环形件相对的聚缩醛树脂制环形表面 上壳体的表面。

公开(公告)号：US06703287B2

公开(公告)日：2004-03-09

申请号：US09791763

申请日：2001-02-26

Applicant: Yoshitaka Fujiishi ,  Atsushi Ueno

Inventor： Yoshitaka Fujiishi ,  Atsushi Ueno

IPC: H01L2176

CPC classification number: H01L21/76229 ,  H01L21/31053

Abstract: An improved method for producing a semiconductor device in which overpolishing is prevented at a chemical mechanical polishing time to eliminate the influence of peripheries on the object part. A plasma oxide film is formed on a semiconductor substrate so as to fill a recess and a trench. With the use of a resist film as a mask, the plasma oxide film is selectively etched to leave an overpolish-preventing support member in a neighborhood of the recess, which is a photo-related mark, for providing a support against overpolishing at a chemical mechanical polishing time. The surface of the semiconductor substrate is polished by chemical mechanical polishing. Thereafter, a nitride film and an oxide film are removed.

Abstract translation: 一种用于制造半导体器件的改进方法，其中在化学机械抛光时间期间防止了过度抛光以消除外围对物体部分的影响。 在半导体基板上形成等离子体氧化膜，以填充凹槽和沟槽。 通过使用抗蚀剂膜作为掩模，选择性地蚀刻等离子体氧化物膜以在作为光相关标记的凹部附近留下防多余的支撑构件，以提供用于在化学品上过度抛光的支撑 机械抛光时间。 通过化学机械抛光对半导体基板的表面进行抛光。 之后，除去氮化物膜和氧化物膜。

公开(公告)号：US4999713A

公开(公告)日：1991-03-12

申请号：US318634

申请日：1989-03-03

Applicant: Atsushi Ueno ,  Takao Suzuki

Inventor： Atsushi Ueno ,  Takao Suzuki

IPC: H04N13/00 ,  H04N13/02

CPC classification number: H04N13/0296 ,  G03B35/08 ,  H04N13/0239

Abstract: Disclosed is an improved interlocked zooming apparatus used in a two-barrel type stereo scopic camera. The improved interlocked zooming apparatus includes an adjusting apparatus for adjusting the range of movement of one of the zoom lenses and an automatic image magnification adjusting apparatus for matching the rates of the change in size of images formed by two cameras. Since the sizes of the images in each of the wide-angle end and the telephoto end are first made uniform by the adjusting apparatus before sensing an image, the sizes of the images formed by both the cameras are uniform over the entire zoom region.

公开(公告)号：US07200515B2

公开(公告)日：2007-04-03

申请号：US11049082

申请日：2005-02-03

Applicant: Takashi Sakabe ,  Emi Takuma ,  Atsushi Ueno

Inventor： Takashi Sakabe ,  Emi Takuma ,  Atsushi Ueno

IPC: G01D5/12

CPC classification number: G01D5/04 ,  B62D15/0215

Abstract: A rotation angle sensor includes a first and a second detection gears rotatable with a steering shaft, a first detector configured to detect a rotation angle of the first detection gear, a second detector configured to detect a rotation angle of the second detection gear, a processor configured to calculate a rotation angle of the steering shaft based on the rotation angles detected by the first and second detectors and a discriminator configured to discriminate whether the rotational angle of the steering shaft, calculated by the processor, falls in an abnormal value, wherein a least common multiple between a cycle of the first detector and a cycle of the second detector is greater than a steering angle measurement range.

Abstract translation: 旋转角度传感器包括可与转向轴一起旋转的第一和第二检测齿轮，被配置为检测第一检测齿轮的旋转角度的第一检测器，被配置为检测第二检测齿轮的旋转角度的第二检测器， 被配置为基于由第一和第二检测器检测的旋转角度来计算转向轴的旋转角度;以及鉴别器，其被配置为鉴别由处理器计算的转向轴的旋转角度是否处于异常值，其中 第一检测器的循环与第二检测器的循环之间的最小公倍数大于转向角测量范围。

公开(公告)号：US06849957B2

公开(公告)日：2005-02-01

申请号：US09725853

申请日：2000-11-30

Applicant: Masahiko Takeuchi ,  Koichiro Narimatsu ,  Atsushi Ueno

Inventor： Masahiko Takeuchi ,  Koichiro Narimatsu ,  Atsushi Ueno

IPC: H01L21/66 ,  G03F9/00 ,  H01L21/027 ,  H01L21/822 ,  H01L23/544 ,  H01L27/04

CPC classification number: G03F9/7084 ,  G03F1/42 ,  G03F9/7076 ,  H01L23/544 ,  H01L2223/54406 ,  H01L2223/5442 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A semiconductor device enabling precise and accurate measurement of an inspection mark in a simple manner is obtained. The semiconductor device includes a device forming area and a dicing line area arranged to surround the device forming area on a semiconductor substrate. In the dicing line area, first and second registration marks formed in different shots are provided, and the first and second registration marks include auxiliary marks for identifying the first and second registration marks.

Abstract translation: 获得能够以简单的方式精确而准确地测量检查标记的半导体器件。 半导体器件包括设置成围绕半导体衬底上的器件形成区域的器件形成区域和切割线区域。 在切割线区域中，设置以不同镜头形成的第一和第二对准标记，并且第一和第二对准标记包括用于识别第一和第二对准标记的辅助标记。

公开(公告)号：US06617080B1

公开(公告)日：2003-09-09

申请号：US09563953

申请日：2000-05-02

Applicant: Toshihide Kawachi ,  Takuya Matsushita ,  Shigenori Yamashita ,  Yuki Miyamoto ,  Atsushi Ueno ,  Shinroku Maejima

Inventor： Toshihide Kawachi ,  Takuya Matsushita ,  Shigenori Yamashita ,  Yuki Miyamoto ,  Atsushi Ueno ,  Shinroku Maejima

IPC: G03F900

CPC classification number: G03F7/70633

Abstract: The present invention provides a photomask, a semiconductor device, and a method for exposing through the photomask. The photomask comprises a photomask substrate, and an on-mask circuit area including an on-mask circuit pattern and an on-mask test mark area including an on-mask test pattern, both formed on the surface of the substrate, wherein the photomask substrate further includes an on-mask photolithography screening mark area including an on-mask comparison pattern and an on-mask screening pattern, the on-mask comparison pattern has substantially the same configuration as at least a part of the on-mask circuit pattern, and the on-mask screening pattern has substantially the same configuration as at least a part of the on-mask test pattern. The present invention allows it to measure the actual displacement generated from an overlaying (i.e. alignment) process for the purpose of eliminating of an the overlay displacement which can take place in a photolithography process.

Abstract translation: 本发明提供了一种光掩模，半导体器件和用于曝光光掩模的方法。 光掩模包括光掩模基板和包括掩模电路图案的掩模电路区域和包括掩模测试图案的掩模测试标记区域，二者都形成在基板的表面上，其中光掩模基板 进一步包括包括掩膜比较图案和掩模屏蔽图案的掩模光刻掩模标记区域，掩模比较图案具有与至少一部分屏蔽电路图案基本相同的配置，以及 掩模掩模图案具有与掩模测试图案的至少一部分基本相同的构造。 本发明允许它测量从重叠（即对准）过程产生的实际位移，以消除可能在光刻工艺中发生的覆盖位移。

公开(公告)号：US06409596B1

公开(公告)日：2002-06-25

申请号：US09150595

申请日：1998-09-10

Applicant: Yasuhiro Hayashida ,  Atsushi Ueno ,  Taishi Yasuda

Inventor： Yasuhiro Hayashida ,  Atsushi Ueno ,  Taishi Yasuda

IPC: A63F1300

CPC classification number: A63F13/53 ,  A63F13/005 ,  A63F13/10 ,  A63F13/245 ,  A63F13/5378 ,  A63F13/803 ,  A63F2300/1062 ,  A63F2300/303 ,  A63F2300/307 ,  A63F2300/64 ,  A63F2300/6661 ,  A63F2300/6676 ,  A63F2300/6684 ,  A63F2300/8017

Abstract: A small screen which enables a player to easily grasp the situation of a game field as well as the positional relationship between the game objects is displayed on a game screen in a game device. A game device which displays on a monitor screen a picture of a game being proceeded in a virtual space by a first object controlled by a player and a second object controlled by a computer comprises a supplementary screen forming means (S210) for forming on the monitor screen a small screen showing the surrounding condition with the first object in the center, a distance calculating means (S202) for calculating the distance between the first object and the second object in the virtual space, and a display magnification setting means (S208) for setting the display magnification on the small screen in correspondence with the distance between the above objects.

Abstract translation: 在游戏装置的游戏画面上显示能够使玩家轻松掌握游戏场地的状况以及游戏对象之间的位置关系的小屏幕。 一种在监视器屏幕上显示由玩家控制的第一对象在虚拟空间中进行的游戏的图片和由计算机控制的第二对象的游戏装置，包括用于在监视器上形成的辅助屏幕形成装置（S210） 屏幕显示中心的第一物体的周围状况的小屏幕，用于计算虚拟空间中的第一物体与第二物体之间的距离的距离计算装置（S202）和显示倍率设定装置（S208），用于 根据上述物体之间的距离设定小屏幕上的显示倍率。

公开(公告)号：US5879843A

公开(公告)日：1999-03-09

申请号：US7362

申请日：1998-01-15

Applicant: Atsushi Ueno

Inventor： Atsushi Ueno

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70633 ,  G03F7/70425 ,  G03F7/70458 ,  G03F9/70

Abstract: A method of reducing a registration error is provided in which the registration error can be uniformly distributed even if an amount of displacement is larger than others at only one of a plurality of measuring points. According to the method, amounts of displacement are measured first at a plurality of measuring points, then one half the sum of the maximum value and the minimum value of the measured amounts of displacement is calculated to obtain a correction value. The correction value is fed back to an exposure apparatus as a correction value for an exposure condition setting file within the exposure apparatus used in an exposure step. The registration error can be distributed uniformly even if amounts of displacement at a plurality of measuring points are considerably different from each other.

Abstract translation: 提供了一种降低配准误差的方法，其中即使在仅多个测量点中的一个测量点处的位移量大于其他位置时，配准误差也可以均匀分布。 根据该方法，首先在多个测量点测量位移量，然后计算测量的位移量的最大值和最小值之和的一半以获得校正值。 将校正值反馈到曝光装置，作为曝光步骤中使用的曝光装置内的曝光条件设定文件的校正值。 即使在多个测量点处的位移量彼此大不相同，也可以均匀地分布配准误差。

公开(公告)号：US20120108304A1

公开(公告)日：2012-05-03

申请号：US13329823

申请日：2011-12-19

Applicant: Satoshi Horie ,  Atsushi Ueno ,  Toru Mori ,  Yuichiro Murotsuka ,  Masahiro Mihara

Inventor： Satoshi Horie ,  Atsushi Ueno ,  Toru Mori ,  Yuichiro Murotsuka ,  Masahiro Mihara

IPC: A63F9/24

CPC classification number: A63F1/04 ,  A63F2009/2407 ,  A63F2009/241 ,  A63F2009/2438 ,  A63F2009/2458 ,  A63F2009/246 ,  A63F2009/2486

Abstract: A game device is provided that can reduce the size of the device and can execute the simulation of a match game scene based on an operation input by a game player. The game device includes a field panel imitating a field of a sporting event, card holding stages that are arranged in the locations indicating the positions of players in the sporting event on the field panel, and holding card in a raised state, a card information reading means for reading card information recorded on the cards held by the card holding stages, and a game execution control means for controlling the execution of a game.

Abstract translation: 提供一种游戏装置，其可以减小装置的尺寸，并且可以基于游戏者输入的操作来执行匹配游戏场景的模拟。 游戏装置包括模拟体育赛事场地的场地面板，卡片保持阶段，其布置在指示场地面板上的运动事件中的玩家的位置的位置，以及保持卡处于升高状态，卡片信息读取 用于读取记录在由卡片保持阶段保持的卡上的卡片信息的装置，以及用于控制游戏执行的游戏执行控制装置。

公开(公告)号：US20090135481A1

公开(公告)日：2009-05-28

申请号：US12359673

申请日：2009-01-26

Applicant: Tetsuya Yamada ,  Atsushi Ueno ,  Takashi Okagawa

Inventor： Tetsuya Yamada ,  Atsushi Ueno ,  Takashi Okagawa

IPC: G02B5/30

CPC classification number: G03B27/72 ,  G03F7/70308

Abstract: The directions of amplitude of polarized light passing through a polarizer are concentric around a position. The polarizer is disposed on the surface of a pupil such that the position lies exactly on the center of the surface of the pupil. Rays of luminous flux of illumination light converted into polarized light by the polarizer are converged onto a wafer with concentric planes of polarization with respect to an optical axis. The illumination light is therefore incident on a photoresist as s-polarized light. Thus, the amount of light entering the photoresist is less likely to depend upon the angle of incidence. Consequently, the contrast of an optical image formed in the photoresist is improved, and hence, resolution characteristics are improved.

Abstract translation: 通过偏振器的偏振光的振幅方向在位置周围同心。 偏振器设置在瞳孔的表面上，使得位置恰好位于瞳孔表面的中心。 通过偏振器转换为偏振光的照明光的光通量的光线会聚到具有相对于光轴的同心圆偏振平面的晶片上。 因此照明光作为s偏振光入射到光致抗蚀剂上。 因此，进入光致抗蚀剂的光的量不太可能取决于入射角。 因此，改善了在光致抗蚀剂中形成的光学图像的对比度，因此提高了分辨率特性。