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US5882378A Method to detect metal impurities in the semiconductor process gases 失效
检测半导体工艺气体中的金属杂质的方法

Method to detect metal impurities in the semiconductor process gases
Abstract:
A process to detect metal impurities in a gas or gas mixture including the steps of directing the gas or gas mixture through non-metallic pipings to a sampling device and sampling the gas or gas mixture for metal impurities detection, wherein the sampling device is close to an inlet and/or outlet of a machine employing the gas or gas mixture as a processing gas, the machine being surrounded by a booth containing a gaseous atmosphere which is continuously circulated in the booth, partially renewing said atmosphere continuously, and exhausting excess atmosphere.
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