发明授权
US5882969A Method for manufacturing an electrically writeable and erasable
read-only memory cell arrangement
失效
用于制造电可写和可擦除的只读存储单元布置的方法
- 专利标题: Method for manufacturing an electrically writeable and erasable read-only memory cell arrangement
- 专利标题(中): 用于制造电可写和可擦除的只读存储单元布置的方法
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申请号: US967419申请日: 1997-11-11
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公开(公告)号: US5882969A公开(公告)日: 1999-03-16
- 发明人: Wolfgang Krautschneider , Franz Hofmann , Hans Reisinger , Josef Willer
- 申请人: Wolfgang Krautschneider , Franz Hofmann , Hans Reisinger , Josef Willer
- 申请人地址: DEX Munich
- 专利权人: Siemens Aktiengesellschaft
- 当前专利权人: Siemens Aktiengesellschaft
- 当前专利权人地址: DEX Munich
- 优先权: DEX19646419.6 19961111
- 主分类号: H01L21/822
- IPC分类号: H01L21/822 ; H01L21/8247 ; H01L29/788 ; H01L29/792 ; H01L21/336 ; H01L29/78
摘要:
In a method for manufacturing an electrically writeable and erasable ad-only memory cell arrangement, by self-adjusting process steps, a read-only memory cell arrangement having memory cells that respectively comprise an MOS transistor with a floating gate is manufactured. The MOS transistors are arranged in rows that run parallel. Adjacent rows thus respectively run alternately on the bottom of longitudinal trenches and between adjacent longitudinal trenches. The control gates laterally surround the floating gates so that the memory cells on the bottom of the longitudinal trenches also comprise a coupling ratio>1. A surface requirement per memory cell of 2F.sup.2 (F minimum structural size) is achieved.
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