发明授权
US5883781A Highly-integrated thin film capacitor with high dielectric constant layer
失效
具有高介电常数层的高度集成的薄膜电容器
- 专利标题: Highly-integrated thin film capacitor with high dielectric constant layer
- 专利标题(中): 具有高介电常数层的高度集成的薄膜电容器
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申请号: US635872申请日: 1996-04-18
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公开(公告)号: US5883781A公开(公告)日: 1999-03-16
- 发明人: Shintaro Yamamichi , Pierre Yves Lesaicherre
- 申请人: Shintaro Yamamichi , Pierre Yves Lesaicherre
- 申请人地址: JPX
- 专利权人: NEC Corporation
- 当前专利权人: NEC Corporation
- 当前专利权人地址: JPX
- 优先权: JPX7-117853 19950419
- 主分类号: H01L21/02
- IPC分类号: H01L21/02 ; H01L21/8242 ; H01G4/06 ; H01G4/20
摘要:
In a capacitor including a silicon substrate and an insulating layer formed on the silicon substrate having a contact hole, a lower electrode layer including a silicon diffusion preventing conductive layer and an oxidation resistance conductive layer, an upper electrode layer, and a high dielectric constant layer therebetween, the silicon diffusion preventing layer is located on or within the contact hole and is isolated from the high dielectric constant layer. The high dielectric constant layer is formed on an upper surface and a side surface of the oxidation resistance conductive layer.
公开/授权文献
- US5191693A Tape type work conveying method and conveying apparatus 公开/授权日:1993-03-09
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