- Patent Title: MOSFET having buried shield plate for reduced gate/drain capacitance
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Application No.: US905513Application Date: 1997-08-04
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Publication No.: US5912490APublication Date: 1999-06-15
- Inventor: Francois Hebert , Daniel Ng
- Applicant: Francois Hebert , Daniel Ng
- Applicant Address: CA Sunnyvale
- Assignee: Spectrian
- Current Assignee: Spectrian
- Current Assignee Address: CA Sunnyvale
- Main IPC: H01L23/552
- IPC: H01L23/552 ; H01L27/088 ; H01L29/06 ; H01L29/40 ; H01L29/78 ; H01L29/72
Abstract:
Gate to drain capacitance in a lateral DMOS and vertical DMOS field effect transistor is minimized by providing a conductive shield plate under the gate and between the gate and the drain of the transistor. In operation, the shield plate is preferably connected to a DC voltage potential and coupled to AC ground for RF power applications. The shield plate is readily fabricated in a conventional polysilicon gate process by adding one additional polysilicon deposition (or other suitable material), one additional mask, and one additional etch step. The shield plate can include a raised portion which provides lateral capacitive isolation between the gate and the drain. Alternatively, a shield contact can be provided above the shield plate and between the gate and drain to provide lateral isolation.
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