发明授权
US5919598A Method for making multilayer resist structures with thermosetting
anti-reflective coatings
失效
制备具有热固性抗反射涂层的多层抗蚀剂结构的方法
- 专利标题： Method for making multilayer resist structures with thermosetting anti-reflective coatings
- 专利标题（中）： 制备具有热固性抗反射涂层的多层抗蚀剂结构的方法
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申请号： US692714申请日： 1996-08-06
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公开(公告)号： US5919598A公开(公告)日： 1999-07-06
- 发明人: Tony D. Flaim , Jim D. Meador , Xie Shao , Terry Lowell Brewer
- 申请人： Tony D. Flaim , Jim D. Meador , Xie Shao , Terry Lowell Brewer
- 申请人地址： MO Rolla
- 专利权人： Brewer Science, Inc.
- 当前专利权人： Brewer Science, Inc.
- 当前专利权人地址： MO Rolla
- 主分类号： C08G59/14
- IPC分类号： C08G59/14 ; C08G59/16 ; C08G59/40 ; C08G59/68 ; C08L63/00 ; C09D163/00 ; G03F7/09 ; G03C1/795 ; C08L5/04 ; C08L59/00 ; G03C1/835
摘要：
A method for making multilayer resist structures for microlithographic processing using a thermosetting anti-reflective coating is disclosed for a broad range of exposure wavelengths, said coating containing an active curing catalyst, ether or ester linkages derived from epoxy functionality greater than 3.0, a dye-grafted hydroxyl-functional oligomer, and an alkylated aminoplast crosslinking agent, all present in a low-to-medium alcohol-containing solvent.
公开/授权文献
- US5157810A Apparatus for measuring the mass of a sliver 公开/授权日：1992-10-27
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