Invention Grant
- Patent Title: Magnetic thin film and magnetic thin film manufacturing method
- Patent Title (中): 磁性薄膜和磁性薄膜制造方法
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Application No.: US881300Application Date: 1997-06-24
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Publication No.: US5935403APublication Date: 1999-08-10
- Inventor: Koichi Suzuki , Kenji Komaki
- Applicant: Koichi Suzuki , Kenji Komaki
- Applicant Address: JPX Osaka
- Assignee: Read-Rite SMI Corporation
- Current Assignee: Read-Rite SMI Corporation
- Current Assignee Address: JPX Osaka
- Main IPC: C25D5/26
- IPC: C25D5/26 ; C25D15/02 ; G11B5/31 ; H01F10/00 ; H01F10/16 ; H01F41/26 ; C25D15/00
Abstract:
A magnetic thin film manufacturing method in which an object of treatment is electroplated in a plating bath so that a magnetic thin film is formed on the surface of the object of treatment. The plating bath contains two or more types of ions selected from a set consisting of Fe.sup.2+ ions, Ni.sup.2+ ions and Co.sup.2+ ions, and fine particles of an insulating material are dispersed in the plating bath. In a more particular embodiment of the invention, a magnetic thin film manufacturing method is characterized by the fact that �a! the aforementioned two or more types of ions selected from a set consisting of Fe.sup.2+ ions, Ni.sup.2+ ions and Co.sup.2+ ions are supplied by means of sulfates and/or chlorides, �b! the plating bath is an acidic bath, and �c! the fine particles of an insulating material that are dispersed in the plating bath are colloidal particles of SiO.sub.2 and/or Al.sub.2 O.sub.3.
Public/Granted literature
- US5271583A Automatic method and operating system for space construction Public/Granted day:1993-12-21
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