- 专利标题： Wet station apparatus having quartz heater monitoring system and method of monitoring thereof
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申请号： US735454申请日： 1996-10-23
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公开(公告)号： US5944939A公开(公告)日： 1999-08-31
- 发明人: Jae-hyung Jung , Young-hwan Yun , Se-jong Ko , Min-sang Yun
- 申请人： Jae-hyung Jung , Young-hwan Yun , Se-jong Ko , Min-sang Yun
- 申请人地址： KRX Suwon
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人地址： KRX Suwon
- 优先权： KRX95-36867 19951024
- 主分类号： H01L21/306
- IPC分类号： H01L21/306 ; H01L21/00 ; H01L21/304 ; C23F1/02
摘要：
A wet station apparatus used for cleaning and wet etching a semiconductor wafer includes a chemical container for holding a chemical solution, a temperature measuring device for measuring a temperature of the chemical solution, a temperature control unit for comparing the temperature measured by the temperature measuring device with a predetermined reference temperature value, and outputting the result as a control signal, a quartz heater for heating the chemical solution, a power supply controller for receiving the control signal and adjusting the power supplied to the quartz heater, and a power switch connected to the power supply controller, for receiving a heating initiation signal and switching power to the quartz heater, wherein a heater monitoring system is further provided for monitoring the operating states of the quartz heater and the power supply controller and notifying an operator of any problems.
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