发明授权
- 专利标题： UV/halogen metals removal process
- 专利标题（中）： UV /卤素金属去除工艺
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申请号： US818890申请日： 1997-03-17
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公开(公告)号： US5954884A公开(公告)日： 1999-09-21
- 发明人: Andrew Scott Lawing , Robert T. Fayfield , Herbert H. Sawin , Jane Chang
- 申请人： Andrew Scott Lawing , Robert T. Fayfield , Herbert H. Sawin , Jane Chang
- 申请人地址： MN Chaska MA Cambridge
- 专利权人： FSI International Inc.,Massachusetts Institute of Technology
- 当前专利权人： FSI International Inc.,Massachusetts Institute of Technology
- 当前专利权人地址： MN Chaska MA Cambridge
- 主分类号： C23F4/00
- IPC分类号： C23F4/00 ; H01L21/302 ; H01L21/304 ; H01L21/306 ; H01L21/3213 ; B08B3/12
摘要：
A chlorine based dry-cleaning system appropriate for removing metal contaminants from the surface of substrate is described in which the metal contaminant is chlorinated and reduced to a volatile metal chloride by UV irradiation. The process parameters of chlorine gas partial pressure, temperature, ultraviolet bandwidth, and/or the sequence of exposure of the substrate to the chlorine containing gas and to the ultraviolet radiation are selected so as to effect substantial removal of the metal without excessive substrate roughening.
公开/授权文献
- US4684290A Apparatus for below-ground driving of pipeline segments 公开/授权日：1987-08-04
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