发明授权
- 专利标题: Semiconductor light emitting device and method of etching
- 专利标题(中): 半导体发光器件及其蚀刻方法
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申请号: US806929申请日: 1997-02-26
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公开(公告)号: US5956362A公开(公告)日: 1999-09-21
- 发明人: Toshiya Yokogawa , Shigeo Yoshii
- 申请人: Toshiya Yokogawa , Shigeo Yoshii
- 申请人地址: JPX Osaka
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JPX Osaka
- 优先权: JPX8-039445 19960227; JPX8-258087 19960930
- 主分类号: H01S5/026
- IPC分类号: H01S5/026 ; H01S5/183 ; H01S5/347 ; H01S5/42 ; H01S3/19
摘要:
A vertical cavity type semiconductor light emitting device includes: a light emitting layer made of a II-IV group compound semiconductor material; a first II-VI group compound semiconductor layer which has an opening at a position corresponding to the inside of the light emitting layer; and an upper mirror and a lower mirror which are provided so as to interpose the light emitting layer therebetween. A current is injected through the opening into the light emitting layer.
公开/授权文献
- USD298884S Portable auto table 公开/授权日:1988-12-13
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