发明授权
US5972435A Method for forming film by plasma polymerization and apparatus for
forming film by plasma polymerization
有权
通过等离子体聚合形成膜的方法和通过等离子体聚合形成膜的装置
- 专利标题： Method for forming film by plasma polymerization and apparatus for forming film by plasma polymerization
- 专利标题（中）： 通过等离子体聚合形成膜的方法和通过等离子体聚合形成膜的装置
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申请号： US125744申请日： 1998-08-24
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公开(公告)号： US5972435A公开(公告)日： 1999-10-26
- 发明人: Mitsuru Takai , Shinji Miyazaki , Kunihiro Ueda , Hiromichi Kanazawa
- 申请人： Mitsuru Takai , Shinji Miyazaki , Kunihiro Ueda , Hiromichi Kanazawa
- 申请人地址： JPX Tokyo
- 专利权人： TDK Corporation
- 当前专利权人： TDK Corporation
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX8/357609 19961227
- 主分类号： B05D7/24
- IPC分类号： B05D7/24 ; C08F2/46 ; C23C14/12 ; C23C14/56
摘要：
The present invention manifests a highly excellent effect of allowing the plasma polymerization film to be formed stably for a long time while very rarely suffering occurrence of abnormal discharge during the formation of the plasma polymerization film and promoting the improvement of the yield of products because it adopts as the electrode for implementing plasma polymerization that of the electrodes which is located on the side confronting a surface on which the plasma polymerization film is formed, coats this electrode with a polymer material at a covering ratio in the range of 50-100%, and effects the formation of the plasma polymerization film on an elongate substrate under the operating pressure in the range of 10.sup.-3 -1 Torr. Further, the properties of the plasma polymerization film also become highly excellent.
公开/授权文献
- US5472691A Superoxide dismutase 公开/授权日：1995-12-05
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