发明授权
- 专利标题: High molecular polyetherpolyester and its production process and use
- 专利标题(中): 高分子聚醚多酯及其制备方法和用途
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申请号: US955065申请日: 1997-10-21
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公开(公告)号: US5973104A公开(公告)日: 1999-10-26
- 发明人: Teruki Matsushita , Hiroshi Itoh , Hiroya Kobayashi , Koji Fukuhara , Yoshinobu Yamamoto
- 申请人: Teruki Matsushita , Hiroshi Itoh , Hiroya Kobayashi , Koji Fukuhara , Yoshinobu Yamamoto
- 申请人地址: JPX Osaka
- 专利权人: Nippon Shokubai Co., Ltd.
- 当前专利权人: Nippon Shokubai Co., Ltd.
- 当前专利权人地址: JPX Osaka
- 主分类号: B01F7/04
- IPC分类号: B01F7/04 ; B29B7/46 ; B29B7/48 ; B29C47/38 ; C08G63/668 ; C08G63/78 ; C08G63/91 ; C08G65/48 ; C08G85/00 ; C08G63/12 ; C08L67/00
摘要:
A film-formable high molecular polyetherpolyester comprising structural unit (1) of formula (1) and functional group (2) of formula (2) and having a number-average molecular weight of 40,000 to 10,000,000, wherein the molar ratio of functional group (2) to R in the polyetherpolyester is in the range of 1.0 to 3.0. This polyetherpolyester can be produced by carrying out a chain extension reaction of a low molecular polyalkylene oxide of 1,000 to 30,000 in number-average molecular weight with a polyvalent acid anhydride at 0.003 MPa or higher in a molar ratio of (acid anhydride group)/(hydroxyl group)=0.8 to 1.0. ##STR1##
公开/授权文献
- US5314944A Pressure sensitive adhesive 公开/授权日:1994-05-24
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