发明授权
- 专利标题: Manufacturing method of single crystal and apparatus of manufacturing the same
- 专利标题(中): 单晶的制造方法及其制造方法
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申请号: US81665申请日: 1998-05-20
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公开(公告)号: US5980630A公开(公告)日: 1999-11-09
- 发明人: Eiichi Iino , Kiyotaka Takano , Masanori Kimura , Hirotoshi Yamagishi
- 申请人: Eiichi Iino , Kiyotaka Takano , Masanori Kimura , Hirotoshi Yamagishi
- 申请人地址: JPX Tokyo
- 专利权人: Shin-Etsu Handotai, Co., Ltd.
- 当前专利权人: Shin-Etsu Handotai, Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX7-158454 19950601
- 主分类号: C30B15/00
- IPC分类号: C30B15/00 ; C30B15/20 ; C30B15/30 ; C30B29/06 ; C30B30/04 ; C30B35/00
摘要:
In a single crystal manufacturing method by a horizontal magnetic field applied CZ method wherein coils are disposed interposing a crucible coaxially with each other, the coils constituting superconductive electromagnets of a magnetic field application apparatus and the silicon crystal is pulled from melt in the crucible while applying a horizontal magnetic field to the melt; an elavation apparatus capable of finely adjusting relative positions of the superconductive electromagnets and the crcucible in a vertical direction is disposed. The descent of a central portion Cm in a depth direction of the melt is canceled by elevating the crucible with the elevating apparatus, the descent being accompanied with proceeding of process of pulling the single crystal, thereby a coil central axis Cc of the superconductive electromagnets always passes through the central portion Cm or below this portion. Compared with the conventional HMCZ method, an uniformity of an intensity distribution of the magnetic field applied to the melt is increased so that a suppression effect on the melt convection all over the crucible is enhanced.
公开/授权文献
- USD405678S Sliding door security bracket 公开/授权日:1999-02-16
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