发明授权
- 专利标题： Optical inspection method and apparatus
- 专利标题（中）： 光学检测方法及装置
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申请号： US984558申请日： 1997-12-03
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公开(公告)号： US5982921A公开(公告)日： 1999-11-09
- 发明人: David Alumot , Gad Neumann , Rivka Sherman , Ehud Tirosh
- 申请人： David Alumot , Gad Neumann , Rivka Sherman , Ehud Tirosh
- 申请人地址： CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： CA Santa Clara
- 优先权： ILX96362 19901116; ILX99823 19911023
- 主分类号： G01N21/94
- IPC分类号： G01N21/94 ; G01N21/95 ; G01N21/956 ; G06K9/00
摘要：
A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.
信息查询
