发明授权
- 专利标题: Illumination system and exposure apparatus
- 专利标题(中): 照明系统和曝光装置
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申请号: US865637申请日: 1997-05-29
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公开(公告)号: US5991088A公开(公告)日: 1999-11-23
- 发明人: Satoru Mizouchi
- 申请人: Satoru Mizouchi
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX8-163891 19960604
- 主分类号: F21V5/00
- IPC分类号: F21V5/00 ; F21V5/04 ; G02B13/00 ; G02B19/00 ; G03F7/20 ; H01L21/027 ; G02B3/00 ; G02B15/14 ; G03B21/14 ; G03B27/42
摘要:
An illumination system includes a light source and an optical system for projecting light from the light source to a surface to be illuminated, wherein the optical system includes an optical element having a paraxial power of substantially zero and having an aspherical surface, and the optical element is movable along an optical axis when an illuminance distribution on the surface to be illuminated is to be changed.
公开/授权文献
- US5352657A Bismuth system oxide superconductors and preparation thereof 公开/授权日:1994-10-04
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