发明授权
- 专利标题: Method of fabricating flash memory cell
- 专利标题(中): 制造闪存单元的方法
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申请号: US24163申请日: 1998-02-17
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公开(公告)号: US5994185A公开(公告)日: 1999-11-30
- 发明人: Yau-Kae Sheu , Gary Hong
- 申请人: Yau-Kae Sheu , Gary Hong
- 申请人地址: TWX Hsinchu
- 专利权人: United Semiconductor Corp.
- 当前专利权人: United Semiconductor Corp.
- 当前专利权人地址: TWX Hsinchu
- 优先权: TWX87101623 19980207
- 主分类号: H01L21/336
- IPC分类号: H01L21/336 ; H01L29/788
摘要:
A method of fabricating a flash memory. A heavily doped region with the opposite polarity of the drain region is formed between the channel region and the drain region. The heavily doped region is in a bar shape extending towards both the drain and the source regions along a side of the floating gate. Furthermore, the reading operation is performed in reverse by applying a zero voltage to the drain region, and a non-zero voltage to the source region.
公开/授权文献
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