发明授权
- 专利标题： Fabrication process using a multi-layer antireflective layer
- 专利标题（中）： 使用多层抗反射层的制造工艺
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申请号： US924652申请日： 1997-09-05
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公开(公告)号： US5998100A公开(公告)日： 1999-12-07
- 发明人: Tsukasa Azuma , Tokuhisa Ohiwa , Tetsuo Matsuda , David M. Dobuzinsky , Katsuya Okumura
- 申请人： Tsukasa Azuma , Tokuhisa Ohiwa , Tetsuo Matsuda , David M. Dobuzinsky , Katsuya Okumura
- 申请人地址： JPX Kawasaki
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JPX Kawasaki
- 主分类号： G03F7/11
- IPC分类号： G03F7/11 ; G03F7/09 ; H01L21/027 ; G03F7/00
摘要：
A fabrication process includes a step of providing a substrate to be fabricated. A multi-layer antireflective layer is then formed on the substrate. A patterned resist having a thickness less than 850 nanometers is formed on the multi-layer antireflective layer and the substrate is fabricated using the patterned resist as a mask.
公开/授权文献
- USD344887S Combined spray bottle and cap 公开/授权日：1994-03-08
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