发明授权
US5999333A Exposure apparatus having catadioptric projection optical system 失效
曝光装置具有反射折射投影光学系统

  • 专利标题: Exposure apparatus having catadioptric projection optical system
  • 专利标题(中): 曝光装置具有反射折射投影光学系统
  • 申请号: US987852
    申请日: 1997-12-09
  • 公开(公告)号: US5999333A
    公开(公告)日: 1999-12-07
  • 发明人: Tomowaki Takahashi
  • 申请人: Tomowaki Takahashi
  • 申请人地址: JPX Tokyo
  • 专利权人: Nikon Corporation
  • 当前专利权人: Nikon Corporation
  • 当前专利权人地址: JPX Tokyo
  • 优先权: JPX6-90837 19940428
  • 主分类号: G02B17/08
  • IPC分类号: G02B17/08 G03F7/20 G02B17/00
Exposure apparatus having catadioptric projection optical system
摘要:
To use a beam splitting optical system smaller than the conventional beam splitters and to set a longer optical path between a concave, reflective mirror and an image plane. A light beam from an object surface travels through a first converging group to enter a beam splitter, and a light beam reflected by the beam splitter is reflected by a concave, reflective mirror to form an image of patterns on the object surface inside the concave, reflective mirror. A light beam from the image of the patterns passes through the beam splitter and thereafter forms an image of the patterns through a third converging group on an image plane.
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