发明授权
- 专利标题: Exposure apparatus having catadioptric projection optical system
- 专利标题(中): 曝光装置具有反射折射投影光学系统
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申请号: US987852申请日: 1997-12-09
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公开(公告)号: US5999333A公开(公告)日: 1999-12-07
- 发明人: Tomowaki Takahashi
- 申请人: Tomowaki Takahashi
- 申请人地址: JPX Tokyo
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX6-90837 19940428
- 主分类号: G02B17/08
- IPC分类号: G02B17/08 ; G03F7/20 ; G02B17/00
摘要:
To use a beam splitting optical system smaller than the conventional beam splitters and to set a longer optical path between a concave, reflective mirror and an image plane. A light beam from an object surface travels through a first converging group to enter a beam splitter, and a light beam reflected by the beam splitter is reflected by a concave, reflective mirror to form an image of patterns on the object surface inside the concave, reflective mirror. A light beam from the image of the patterns passes through the beam splitter and thereafter forms an image of the patterns through a third converging group on an image plane.
信息查询
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B17/00 | 有或无折射元件的具有反射面的系统 |
G02B17/08 | .折反射系统 |