发明授权
- 专利标题： Positioning apparatus and exposure apparatus using the same
- 专利标题（中）： 定位装置及使用其的曝光装置
-
申请号： US61245申请日： 1998-04-17
-
公开(公告)号： US6028376A公开(公告)日： 2000-02-22
- 发明人: Eiji Osanai , Kotaro Akutsu , Hirohito Ito
- 申请人： Eiji Osanai , Kotaro Akutsu , Hirohito Ito
- 申请人地址： JPX Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX9-117409 19970422; JPX9-268665 19971001; JPX9-366721 19971226
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01L21/68 ; H01L21/00
摘要：
A positioning apparatus includes a movable stage, a first linear motor for moving the stage in a predetermined direction, a platform for supporting the first linear motor, and an inertial force application mechanism for applying a force for canceling a force acting on the platform, which is generated when the stage is moved by the first linear motor. The inertial force application mechanism includes amass body, a guide for supporting and guiding the mass body, a second linear motor for moving the mass body, and a controller for controlling the second linear motor. Since the inertial force application mechanism of the positioning apparatus prevents transmission of vibration generated by an increase in an exciting force of the stage, rapid and precise positioning can be performed.