公开(公告)号：US6028376A

公开(公告)日：2000-02-22

申请号：US61245

申请日：1998-04-17

申请人： Eiji Osanai ,  Kotaro Akutsu ,  Hirohito Ito

发明人： Eiji Osanai ,  Kotaro Akutsu ,  Hirohito Ito

IPC分类号： G03F7/20 ,  H01L21/68 ,  H01L21/00

CPC分类号： G03F7/70766 ,  G03F7/70716 ,  H01L21/682 ,  Y10T74/20201

摘要： A positioning apparatus includes a movable stage, a first linear motor for moving the stage in a predetermined direction, a platform for supporting the first linear motor, and an inertial force application mechanism for applying a force for canceling a force acting on the platform, which is generated when the stage is moved by the first linear motor. The inertial force application mechanism includes amass body, a guide for supporting and guiding the mass body, a second linear motor for moving the mass body, and a controller for controlling the second linear motor. Since the inertial force application mechanism of the positioning apparatus prevents transmission of vibration generated by an increase in an exciting force of the stage, rapid and precise positioning can be performed.

摘要翻译： 定位装置包括可动台，用于沿预定方向移动平台的第一线性马达，用于支撑第一线性马达的平台，以及用于施加用于抵消作用在平台上的力的力的惯性力施加机构， 当舞台被第一线性电动机移动时产生。 惯性力施加机构包括：主体，用于支撑和引导质量体的引导件，用于移动质量体的第二线性马达和用于控制第二线性马达的控制器。 由于定位装置的惯性力施加机构防止由于舞台的激励力的增加而产生的振动的传播，因此能够进行快速且精确的定位。

公开(公告)号：US5939852A

公开(公告)日：1999-08-17

申请号：US919480

申请日：1997-08-28

申请人： Kotaro Akutsu ,  Eiji Osanai ,  Hirohito Ito

发明人： Kotaro Akutsu ,  Eiji Osanai ,  Hirohito Ito

IPC分类号： H01L21/027 ,  B23Q1/62 ,  B23Q5/28 ,  B23Q11/00 ,  G03F7/20 ,  G05B19/23 ,  G05B5/01 ,  G05B19/18

CPC分类号： G03F7/70716 ,  B23Q1/621 ,  B23Q11/0032 ,  B23Q5/28 ,  G03F7/709 ,  G05B19/232 ,  G05B2219/37275 ,  G05B2219/49275 ,  G05B2219/49276

摘要： A stage feeding device has a movable guide which is guided on a reference surface of a platen to be movable in the Y-direction, a Y-linear motor for moving the movable guide in the Y-direction, a movable stage which is supported by the movable guide to be movable in the X-direction, and carries an object, and an X-linear motor for moving the movable stage in the X-direction. The stator of the X-linear motor is supported by a second stationary guide to be movable in only the Y-direction independently of the movable guide, and is moved in the Y-direction by a driving mechanism. The stator of the Y-linear motor and the second stationary guide are fixed to the base, and mount members for removing vibrations are arranged between the base and the platen.

摘要翻译： 台架供给装置具有可在Y方向上可移动的台板的基准面上引导的可动引导件，Y方向上移动可动引导件的Y线性马达，由Y方向支承的可动引导件 所述可动引导件能够沿X方向移动并承载物体;以及X线性电动机，用于沿X方向移动所述可动台。 X线性电动机的定子由第二固定引导件支撑，仅在Y方向上可移动地独立于可动引导件，并且通过驱动机构沿Y方向移动。 Y线性电动机的定子和第二静止导轨固定在基座上，用于去除振动的安装构件设置在基座和压板之间。

公开(公告)号：US06359679B1

公开(公告)日：2002-03-19

申请号：US09480180

申请日：2000-01-10

申请人： Hirohito Ito ,  Kotaro Akutsu

发明人： Hirohito Ito ,  Kotaro Akutsu

IPC分类号： G03B2762

CPC分类号： G03F7/70691 ,  G03B27/62

摘要： A positioning device includes a stage which is movable along a reference surface, a stage driving mechanism for driving the stage, and an inertia imparting mechanism for reducing a reaction force produced by driving the stage. The inertia imparting mechanism has a mass body, which is movable with respect to a stage base or a structure, and a mass body driving mechanism for driving the mass body, and the stage base or structure is given inertia by driving the mass body. The inertia imparting mechanism also includes a reaction force compensation, which, by moving the mass body, reduces reaction force caused by motion of the stage, and a positioning compensation control system, which compensates for the position of the mass body. Thus, it is possible to reduce a reaction force produced by motion of the stage, and to compensate for position offset of the mass body.

摘要翻译： 定位装置包括能够沿着基准面移动的平台，用于驱动平台的平台驱动机构，以及用于减小通过驱动平台产生的反作用力的惯性赋予机构。 惯性赋予机构具有能够相对于台架或结构体移动的质量体和用于驱动质量体的质量体驱动机构，并且通过驱动质量体来赋予台架或结构体的惯性。 惯性施加机构还包括反作用力补偿，其通过移动质量体来减小由载物台的运动引起的反作用力和定位补偿控制系统，其补偿质量体的位置。 因此，可以减少由台的运动产生的反作用力，并补偿质量体的位置偏移。

公开(公告)号：US6008882A

公开(公告)日：1999-12-28

申请号：US982526

申请日：1997-12-02

申请人： Hirohito Ito ,  Kotaro Akutsu

发明人： Hirohito Ito ,  Kotaro Akutsu

IPC分类号： H01L21/68 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/58

CPC分类号： G03F7/707

摘要： A precision stage is provided so as to be movable along the Z axis, in the .theta. direction, which is the direction of rotation about the Z axis, and in two oblique directions inclined with respect to the Z axis. The stage has a sensor for measuring stage position along the Z axis. Reference-position return of this sensor is carried out. Reference-position return of two Y laser interferometers for measuring the .theta. position of the precision stage is carried out in a state in which the positions of the precision stage in the direction along the Z axis and in the oblique directions are held at predetermined reference positions. After this reference-position return is carried out, reference-position return is performed with regard to an X laser interferometer and the two Y laser interferometers in a state in which the positions of the precision stage in the direction along the Z axis, in the oblique directions and in the .theta. direction are held at predetermined reference positions.

摘要翻译： 提供精度级，以便能够沿着作为围绕Z轴的旋转方向的θ方向以及相对于Z轴倾斜的两个倾斜方向沿Z轴移动。 舞台有一个用于测量沿着Z轴的舞台位置的传感器。 执行该传感器的参考位置返回。 用于测量精密级的θ位置的两个Y激光干涉仪的参考位置返回是在精度级沿Z轴和倾斜方向的位置被保持在预定参考位置的状态下进行的 。 在执行该参考位置返回之后，对于X激光干涉仪和两个Y激光干涉仪，在沿着Z轴的方向上的精度级位置的状态下执行基准位置返回 倾斜方向和θ方向保持在预定的参考位置。

公开(公告)号：US08618516B2

公开(公告)日：2013-12-31

申请号：US13294380

申请日：2011-11-11

申请人： Hirohito Ito

发明人： Hirohito Ito

IPC分类号： H01J37/147

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/3177 ,  H01J2237/304 ,  H01J2237/31766

摘要： A charged-particle beam exposure apparatus which includes a deflector that deflects a charged-particle beam, and a stage mechanism that drives a substrate, and draws a pattern on the substrate while scanning the charged-particle beam in a main-scanning direction by the deflector and scanning the substrate in a sub-scanning direction by the stage mechanism. The apparatus includes a blanker unit configured to control irradiation and unirradiation of the substrate with the charged-particle beam, and a controller configured to control the deflector to deflect the charged-particle beam in the sub-scanning direction by an amount of driving of the substrate in the sub-scanning direction by the stage mechanism during a period of time from stop of drawing on the substrate until restart thereof when the drawing on the substrate is stopped and then restarted while the substrate is driven in the sub-scanning direction by the stage mechanism.

公开(公告)号：US20110159189A1

公开(公告)日：2011-06-30

申请号：US12971696

申请日：2010-12-17

申请人： Hirohito Ito ,  Nobushige Korenaga ,  Makoto Miyazaki

发明人： Hirohito Ito ,  Nobushige Korenaga ,  Makoto Miyazaki

IPC分类号： B05D3/12 ,  B05C11/02

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： An imprint apparatus is disclosed that forms, by pressing a resin applied onto a substrate and a mold against each other, a pattern on the substrate. The imprint apparatus includes a substrate stage that holds the substrate, and a control unit for controlling the position of the stage by outputting a manipulating variable on the basis of a position error between a position of the stage which has been measured by position measurement unit and a target position. The control unit reduces a ratio of the manipulating variable to the position error while the substrate and the mold are in contact with each other until mold release.

摘要翻译： 公开了一种压印装置，其通过将施加到基板和模具上的树脂彼此压制在基板上形成图案。 压印装置包括保持基板的基板台，以及控制单元，其通过基于由位置测量单元测量的台的位置与位置误差之间的位置误差输出操作变量来控制台的位置;以及控制单元， 目标位置。 控制单元减少操作变量与位置误差的比率，同时基板和模具彼此接触直到脱模。

公开(公告)号：US07615915B2

公开(公告)日：2009-11-10

申请号：US11785840

申请日：2007-04-20

申请人： Hirohito Ito ,  Takahiro Matsuura

发明人： Hirohito Ito ,  Takahiro Matsuura

IPC分类号： H01T13/20

CPC分类号： H01T13/39

摘要： A spark plug having a protrusion amount t of not smaller than 0.3 mm and satisfying a relation θ1+θ2≦93° in which θ1 is an included angle between virtual lines s1 and s2, and θ2 is an included angle between virtual lines s3 and s4 when the virtual line s1 is taken as a line parallel to a direction of an axis and including the other end side edge on a leading end surface of a first precious metal tip, the virtual line s2 is taken as a line connecting the other end side edge and a point of intersection between an inner circumferential surface of a ground electrode body and the other end surface of the ground electrode body, the virtual line s3 is taken as a line parallel to the direction of the axis and including the other end side edge on a leading end surface of a center electrode, and the virtual line s4 is taken as a line including the other end side edge and tangent to an insulator.

摘要翻译： 具有不小于0.3mm的突出量t并且满足theta1 +θ2<= 93°的火花塞，其中θ1是虚拟线s1和s2之间的夹角，θ2是虚拟线s3和 当虚线s1被取为与轴方向平行的线并且包括在第一贵金属尖端的前端表面上的另一端侧边缘时，将虚线s2作为连接另一端的线 在接地电极体的内周面与接地电极体的另一端面之间的交点的一侧边缘和虚拟线s3为与轴方向平行的线，并且包括另一端侧 边缘在中心电极的前端表面上，并且假想线s4被视为包括另一端侧边缘并与绝缘体相切的线。

公开(公告)号：US06559579B2

公开(公告)日：2003-05-06

申请号：US09725180

申请日：2000-11-29

申请人： Hirohito Ito ,  Kenji Nunome ,  Makoto Sugimoto ,  Kuniharu Tanaka ,  Katsura Matsubara ,  Yoshihiro Yamamoto ,  Masaya Ito

发明人： Hirohito Ito ,  Kenji Nunome ,  Makoto Sugimoto ,  Kuniharu Tanaka ,  Katsura Matsubara ,  Yoshihiro Yamamoto ,  Masaya Ito

IPC分类号： H01T1320

CPC分类号： H01T13/38

摘要： An insulator for spark plug comprises an alumina-based sintered body comprising: Al2O3 as a main component; and at least one component (hereinafter referred to as “&bgr; component”) selected from the group consisting of Ca component, Sr component and Ba component, wherein the alumina-based sintered body comprises particles comprising a compound comprising the &bgr; component and Al component, the compound having a molar ratio of the Al component to the &bgr; component of 4.5 to 6.7 as calculated in terms of oxides thereof, and has a relative density of 90% or more.

摘要翻译： 一种用于火花塞的绝缘体包括：氧化铝基烧结体，其包括：Al 2 O 3作为主要成分; 以及选自由Ca成分，Sr成分和Ba成分组成的组中的至少一种成分（以下称为“β成分”），其中，所述氧化铝系烧结体包含含有β成分和Al成分的化合物的粒子， 所述化合物的Al成分与β成分的摩尔比以其氧化物计算为4.5〜6.7，相对密度为90％以上。

公开(公告)号：US07738232B2

公开(公告)日：2010-06-15

申请号：US10834845

申请日：2004-04-30

申请人： Hirohito Ito

发明人： Hirohito Ito

IPC分类号： H01H47/00

CPC分类号： G03F7/70716 ,  G03F7/70758 ,  H02K41/0354

摘要： In driving a movable body in a target direction, a force in another direction, which may act on the movable body, is reduced. A system includes a current amplifier, which drives X1 and X2 electromagnets (a first actuator) for aligning the movable body in the X direction, a system including a current amplifier, which drives Y1 and Y2 electromagnets (a second actuator) for aligning the movable body in the Y direction, a subordinate direction component correction unit, which reduces a force in the Y direction acting on the movable body when driving the movable body in the X direction by the first actuator, and a subordinate direction component correction unit, which reduces a force in the X direction acting on the movable body when driving the movable body in the Y direction by the second actuator.

摘要翻译： 在目标方向驱动可动体时，能够作用于移动体的另一方向的力减小。 一种系统包括一个电流放大器，它驱动X1和X2电磁铁（第一致动器），用于在X方向上对准可移动体;一个系统，包括一个电流放大器，驱动Y1和Y2电磁铁（第二个致动器） 主体在Y方向上，下位方向分量校正单元，其通过第一致动器在X方向上驱动可动体时减小作用在可动体上的Y方向上的力;以及下降方向分量校正单元， 当由第二致动器沿Y方向驱动可移动体时，在X方向上的力作用在可移动体上。

公开(公告)号：US20090033901A1

公开(公告)日：2009-02-05

申请号：US12181215

申请日：2008-07-28

申请人： Hirohito Ito

发明人： Hirohito Ito

IPC分类号： G03B27/42

CPC分类号： G03F7/70841 ,  G03F7/70758

摘要： A driving apparatus for driving an object in a vacuum environment includes a first chamber whose interior is maintained in a vacuum environment, a mover configured to load the object, and a stator, wherein the mover includes one or more magnets, the stator includes one or more coils. The mover moves along an upper surface of the stator in a non-contact state therewith when an electric current is applied to the coil or coils. The upper surface of the stator is a part of a partition wall of the first chamber.

摘要翻译： 用于在真空环境中驱动物体的驱动装置包括其内部保持在真空环境中的第一室，被配置为装载物体的移动器和定子，其中，所述动子包括一个或多个磁体，所述定子包括一个或多个 更多的线圈 当向线圈或线圈施加电流时，动子在与其非接触状态下沿着定子的上表面移动。 定子的上表面是第一室的分隔壁的一部分。