发明授权
US6030978A Antifungal formulation comprising protoberberine derivatives and salts
thereof
失效
抗真菌制剂,其包含原青霉素衍生物及其盐
- 专利标题: Antifungal formulation comprising protoberberine derivatives and salts thereof
- 专利标题(中): 抗真菌制剂,其包含原青霉素衍生物及其盐
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申请号: US208641申请日: 1998-12-10
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公开(公告)号: US6030978A公开(公告)日: 2000-02-29
- 发明人: Jung Ho Kim , Tae Neung Jhong , Young Ki Paik , Joon Seo Park , Eui Deok Kim , You Suk Lee , Seung Un Kim
- 申请人: Jung Ho Kim , Tae Neung Jhong , Young Ki Paik , Joon Seo Park , Eui Deok Kim , You Suk Lee , Seung Un Kim
- 申请人地址: KRX Seoul
- 专利权人: Hanwha Corporation
- 当前专利权人: Hanwha Corporation
- 当前专利权人地址: KRX Seoul
- 优先权: KRX98/14795 19980424
- 主分类号: A61K31/00
- IPC分类号: A61K31/00 ; A61K31/435 ; A61K31/4353 ; A61K31/4375 ; A61K31/47 ; A61K36/71 ; A61P31/00 ; A61P31/10 ; C07D455/03 ; C07D471/04 ; C07D491/056 ; A61K31/44
摘要:
The antifungal formulation comprising the novel compounds of the following chemical formulae (I) and (II) exhibit in vitro antifungal activity against fungi including cutaneous filamentous fungus, such as Epidermophyton, Microsporum, Trichophyton, Sporothrix schenckii, Aspergillus or Candida. The formulation of the present invention exhibit in vitro antifungal activity at the concentration of 1-100 .mu.g/ml. ##STR1## wherein R.sup.1, R.sup.2, and R.sup.4 may be the same or different, and represent C.sub.1 -C.sub.5 alkoxy, R.sup.3 represents hydrogen or C.sub.1 -C.sub.10 alkyl, A.sup.- represents inorganic acid ion, organic acid ion or halide, R.sup.5 represents hydrogen, pyridylmethyl, substituted pyridylmethyl or a group having the following chemical formula(XI) ##STR2## wherein Z.sup.1, Z.sup.2, Z.sup.3, Z.sup.4 and Z.sup.5 may be the same or different and represent hydrogen, halogen, C.sub.1 -C.sub.5 alkyl, trifluoromethyl, phenyl, substituted phenyl, nitro, C.sub.1 -C.sub.4 alkoxy, C.sub.1 -C.sub.4 alkylamino, acetylamino, C.sub.1 -C.sub.8 trialkyl ammonium, guanidinyl, methylthio, ethylthio, trifluoromethoxy, hydroxy, phenoxy, vinyl, carboxyl and C.sub.1 -C.sub.2 alkoxycarbonyl group.
公开/授权文献
- US4322324A Ampho-ionic group-containing alkyd resins 公开/授权日:1982-03-30
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