发明授权
US6032513A Apparatus and method for measuring contaminants in semiconductor
processing chemicals
失效
用于测量半导体加工化学品中污染物的装置和方法
- 专利标题: Apparatus and method for measuring contaminants in semiconductor processing chemicals
- 专利标题(中): 用于测量半导体加工化学品中污染物的装置和方法
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申请号: US107109申请日: 1998-06-30
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公开(公告)号: US6032513A公开(公告)日: 2000-03-07
- 发明人: Russell A. Chorush , Jeremiah D. Hogan , Deepta Varadarajan
- 申请人: Russell A. Chorush , Jeremiah D. Hogan , Deepta Varadarajan
- 申请人地址: TX Dallas
- 专利权人: Texas Instruments Incorporated
- 当前专利权人: Texas Instruments Incorporated
- 当前专利权人地址: TX Dallas
- 主分类号: G01N30/02
- IPC分类号: G01N30/02 ; G01N33/00 ; H01J49/42 ; G01N30/74 ; G01N27/62 ; G01D55/44
摘要:
An trace analyzer apparatus and method useful in semiconductor processing for measuring trace impurities in gases and liquids comprising a gas chromatograph serving to replace a bulk gas in a composition of bulk gas including contaminants in a bulk gas stream with a carrier gas having a higher ionization potential than that of said contaminants, where such gas chromatograph is connected to a hollow electrode (14) for initiating ionization of said contaminants by electrical discharge, where such electrode is electrically isolated from a source housing (44) and adjacent to a skimmer plate (16) that ionizes trace contaminants that are measured using a mass spectrometer, is disclosed.