发明授权
US6032513A Apparatus and method for measuring contaminants in semiconductor processing chemicals 失效
用于测量半导体加工化学品中污染物的装置和方法

Apparatus and method for measuring contaminants in semiconductor
processing chemicals
摘要:
An trace analyzer apparatus and method useful in semiconductor processing for measuring trace impurities in gases and liquids comprising a gas chromatograph serving to replace a bulk gas in a composition of bulk gas including contaminants in a bulk gas stream with a carrier gas having a higher ionization potential than that of said contaminants, where such gas chromatograph is connected to a hollow electrode (14) for initiating ionization of said contaminants by electrical discharge, where such electrode is electrically isolated from a source housing (44) and adjacent to a skimmer plate (16) that ionizes trace contaminants that are measured using a mass spectrometer, is disclosed.
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