发明授权
- 专利标题: Electron beam exposure method using a moving stage
- 专利标题(中): 使用移动台的电子束曝光方法
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申请号: US083095申请日: 1998-05-22
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公开(公告)号: US06040583A公开(公告)日: 2000-03-21
- 发明人: Naka Onoda
- 申请人: Naka Onoda
- 申请人地址: JPX Tokyo
- 专利权人: NEC Corporation
- 当前专利权人: NEC Corporation
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX9-131539 19970522
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; H01J37/305 ; H01J37/317 ; H01L21/027 ; H01J37/302
摘要:
An electron beam exposure system has a continuous stage drive for driving a stage at a constant speed. Area of a semiconductor chip is divided into an array of unit meshes to calculate pattern density in each mesh. A group of meshes having an equal density level is combined as a sub-strip region having dimensions equal to or lower than the maximum width determined based on the ability of the electron beam exposure system.
公开/授权文献
- USD405730S Tire tread 公开/授权日:1999-02-16