Invention Grant
- Patent Title: Positive-working photosensitive composition
- Patent Title (中): 正性感光组合物
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Application No.: US270516Application Date: 1999-03-17
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Publication No.: US6060213APublication Date: 2000-05-09
- Inventor: Kunihiko Kodama
- Applicant: Kunihiko Kodama
- Applicant Address: KRX Kanagawa
- Assignee: Fuji Photo Film Co., Ltd.
- Current Assignee: Fuji Photo Film Co., Ltd.
- Current Assignee Address: KRX Kanagawa
- Priority: JPX10-066990 19980317
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03C1/73 ; G03C1/72
Abstract:
The present invention provides a positive-working photosensitive composition which comprises (a) a basic nitrogen-containing compound having a polycyclic structure represented by formula (I) and (b) at least one of compounds represented by formulae (II) to (IV) defined in the specification: wherein Y and Z may be the same or different and each represent a straight-chain, branched or cyclic alkylene group, which may contain a hetero atom or may be substituted. The positive-working photosensitive composition which exhibits no reduction of width of resist pattern or no T-top deformation of surface shape of resist pattern with time between after exposure and heat treatment without causing sensitivity drop.
Public/Granted literature
- US5003128A Electrical switch and outlets protecting cover for painting Public/Granted day:1991-03-26
Information query
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