发明授权
- 专利标题: Dispense system of a photoresist coating machine
- 专利标题(中): 光刻胶涂布机分配系统
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申请号: US185778申请日: 1998-11-03
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公开(公告)号: US6062442A公开(公告)日: 2000-05-16
- 发明人: Ming-Che Yang , Kuo-Feng Huang , Eric Liu , En-Tien Tan
- 申请人: Ming-Che Yang , Kuo-Feng Huang , Eric Liu , En-Tien Tan
- 申请人地址: TWX Hsinchu
- 专利权人: United Microelectronics Corp.
- 当前专利权人: United Microelectronics Corp.
- 当前专利权人地址: TWX Hsinchu
- 主分类号: B65D5/72
- IPC分类号: B65D5/72
摘要:
A photoresist dispensing system used in a photoresist coating machine includes a pump, a sucking-back valve, a solenoid valve, a first pump speed controller, a second pump speed controller and a sucking-back speed controller. The pump is used to transport photoresist and spray a substrate. The sucking-back valve is used to suck back liquid photoresist from a transporting duct end. The solenoid is used to activate or inactivate the pump and the sucking-back valve. The first and the second pump speed controllers are separately coupled between the pump and the solenoid valve, and the sucking-back speed controller is coupled between the sucking-back valve and the sucking-back speed controller is coupled between the sucking-back valve and the route, where is between the pump and the second pump speed controller. Hence, the sucking-back valve produces a sucking force after the pump is inactivated and releases a sucking force after pump is activated.