发明授权
- 专利标题： Method of manufacturing very small diameter deep passages
- 专利标题（中）： 制造非常小直径的深通道的方法
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申请号： US54987申请日： 1998-04-03
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公开(公告)号： US6065203A公开(公告)日： 2000-05-23
- 发明人: Edwin G. Haas , Robert M. Gutowski , Vincent S. Calia
- 申请人： Edwin G. Haas , Robert M. Gutowski , Vincent S. Calia
- 申请人地址： NY Bethpage
- 专利权人： Advanced Energy Systems, Inc.
- 当前专利权人： Advanced Energy Systems, Inc.
- 当前专利权人地址： NY Bethpage
- 主分类号： B05B1/00
- IPC分类号： B05B1/00 ; G03F7/20 ; H05G2/00 ; B21D39/00
摘要：
A method of fabricating very small diameter deep passages is provided. The method of fabricating very small diameter deep passages may include fabricating a recess (206) in a first side (202) of an article (200). An article passage (216) may be fabricated between a second side (204) of the article (200) and the recess (206). An insert (220) may be provided sized to fit the recess (206). An insert passage (230) may be fabricated in the insert (220). The insert (220) may then be secured in the recess (206), with the insert passage (230) and the article passage (216) aligned.
公开/授权文献
- US4271394A Amplifier circuit 公开/授权日：1981-06-02
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