发明授权
US6087274A Nanoscale X-Y-Z translation of nanochannel glass replica-based masks for
making complex structures during patterning
失效
纳米尺度的X-Y-Z平移纳米通道玻璃复制掩模，用于在图案化过程中形成复杂的结构
- 专利标题： Nanoscale X-Y-Z translation of nanochannel glass replica-based masks for making complex structures during patterning
- 专利标题（中）： 纳米尺度的X-Y-Z平移纳米通道玻璃复制掩模，用于在图案化过程中形成复杂的结构
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申请号： US34310申请日： 1998-03-03
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公开(公告)号： US6087274A公开(公告)日： 2000-07-11
- 发明人: Ronald J. Tonucci , Douglas H. Pearson
- 申请人： Ronald J. Tonucci , Douglas H. Pearson
- 申请人地址： DC Washington
- 专利权人： The United States of America as represented by the Secretary of the Navy
- 当前专利权人： The United States of America as represented by the Secretary of the Navy
- 当前专利权人地址： DC Washington
- 主分类号： C03C17/00
- IPC分类号： C03C17/00 ; C03C15/00
摘要：
The present invention is a process for making complex structures with nanoscale resolution in parallel by placing an NCG replica-based mask (or other suitable mask) in close proximity to a substrate and controlling, with nanoscale accuracy and precision, the relative movement of the mask and substrate while sequentially or concurrently carrying out a patterning process or processes. Another aspect of the invention is a diamond film with submicron and/or nanoscale features, that can be made by the method of the invention.
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