发明授权
- 专利标题: Semiconductor device substrate and method of manufacturing the same
- 专利标题(中): 半导体器件基板及其制造方法
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申请号: US864958申请日: 1997-05-29
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公开(公告)号: US6091137A公开(公告)日: 2000-07-18
- 发明人: Masatoshi Fukuda
- 申请人: Masatoshi Fukuda
- 申请人地址: JPX Kawasaki
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX8-138344 19960531
- 主分类号: H01L23/13
- IPC分类号: H01L23/13 ; H01L23/31 ; H01L23/498 ; H05K3/24 ; H01L23/02
摘要:
A semiconductor device is provided that includes a substrate having a first side, a second side, and a through-hole. An external connection terminal is located on the first side of the substrate, and a chip connection terminal is located on the second side of the substrate. The chip connection terminal is electrically connected to the external connection terminal via the through-hole. In one preferred embodiment, the external connection terminal, the inner portion of the through hole, and a first portion of the chip connection terminal have a hard gold plating, and a second portion of the chip connection terminal has a soft gold plating. In another preferred embodiment, the chip connection terminal, the inner portion of the through hole, and a first portion of the external connection terminal have a soft plating, and a second portion of the external connection terminal has a hard gold plating. Thus, in the present invention, there is no plating boundary located within the through-hole, so the reliability of the interconnection that passes through the through-hole is improved. The present invention also provides a method of manufacturing such a device.
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