发明授权
- 专利标题: Electrolytic in-process dressing method, electrolytic in-process dressing apparatus and grindstone
- 专利标题(中): 电解在线修整方法,电解过程中敷料装置和磨石
-
申请号: US156705申请日: 1998-09-18
-
公开(公告)号: US6117001A公开(公告)日: 2000-09-12
- 发明人: Toshiyuki Enomoto , Hiroyuki Endo , Yutaka Shimazaki , Yasuhiro Tani , Yoshiyuki Sato
- 申请人: Toshiyuki Enomoto , Hiroyuki Endo , Yutaka Shimazaki , Yasuhiro Tani , Yoshiyuki Sato
- 申请人地址: JPX Tokyo
- 专利权人: Ricoh Company, Ltd.
- 当前专利权人: Ricoh Company, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX7-200155 19950807; JPX8-093543 19960322
- 主分类号: B24B1/00
- IPC分类号: B24B1/00 ; B24B53/00 ; B24D3/02 ; B24D3/34 ; B24D11/00
摘要:
An electrolytic in-process dressing method, an electrolytic in-process dressing grinding apparatus, and an electrolytic in-process dressing grindstone, for grinding workpiece as the grindstone is being subjected to electrolytic in-process dressing, are provided, in which the grindstone is made of abrasive grains and a binding material which is capable of forming a uniform and fine passive layer at the grinding surface thereof and also capable of preventing excessive elusion of the binding material, thereby preventing the formation of chips at the ground surface in the course of grinding operation.
信息查询